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Phosphorus trifluoride

Phosphorus trifluoride (PF₃) is an consisting of a central phosphorus atom bonded to three atoms in a trigonal pyramidal , with a molecular weight of 87.97 g/mol. It appears as a colorless, odorless gas at standard conditions, with a of 3.91 g/L, a of −151.5 °C, and a of −101.8 °C. PF₃ is highly reactive toward , undergoing slow to form and , and it is notable for its role as a analogous to in coordination chemistry. The compound is typically synthesized via halogen exchange reactions, such as the fluorination of (PCl₃) with or other fluoride sources under controlled conditions to yield PF₃ and byproducts like HCl. Alternative industrial preparations involve the direct reaction of elemental phosphorus with anhydrous at elevated temperatures (180–220 °C) under autogenous pressure. Due to its π-acceptor properties, PF₃ forms stable complexes with metals like iron, , and , often substituting for in carbonyl compounds, as demonstrated in the preparation of (PF₃)₃Fe()₂ from Fe()₅. PF₃ is used as a in organometallic and coordination compounds, where its electron-withdrawing nature influences reaction selectivity similar to but with enhanced stability in some systems, and in processing, such as and , leveraging its reactivity to form volatile byproducts like CFₓ species that aid in material patterning. However, its handling requires stringent safety measures owing to ; inhalation causes severe respiratory distress, and contact leads to corrosive burns on and eyes, with an ACGIH of 2.5 mg/m³.

Structure and bonding

Molecular geometry

Phosphorus trifluoride adopts a , featuring the central atom at the apex bonded to three atoms that form the base of the pyramid. This arrangement arises from the presence of a on the atom, which occupies one vertex of an idealized around the central atom. The geometry aligns with the Valence Shell Electron Pair Repulsion () theory prediction for an AX<sub>3</sub>E<sub>1</sub> electron domain configuration, where the exerts greater repulsion than the bonding pairs, distorting the structure from trigonal planar. The F–P–F bond angle measures approximately 96.3°, significantly smaller than the tetrahedral ideal of 109.5° due to enhanced repulsion from the on phosphorus. The P–F is 1.56 . This asymmetry imparts a of 1.03 D to the , with the negative end directed toward the atoms.

Electronic properties

Phosphorus trifluoride (PF₃) features a central atom that undergoes sp³ hybridization in its valence bond description, forming four equivalent hybrid orbitals. Three of these orbitals are utilized to create σ-bonds with the atoms, while the fourth hybrid orbital houses the of electrons on phosphorus. This hybridization arrangement accounts for the molecule's overall electron domain geometry being tetrahedral, with the lone pair influencing the molecular shape. In terms of bonding, the on enables PF₃ to function as a σ-donor by donating into the σ-acceptor orbital of a coordinated metal center. Additionally, PF₃ exhibits π-acceptor capability through its empty d-orbitals on the atom, which can accept from filled metal d-orbitals via π-backbonding. This dual donor-acceptor behavior is particularly pronounced in PF₃ compared to other phosphines, owing to the electronegative substituents that lower the energy of the phosphorus-based acceptor orbitals. The analysis of the reveals zero formal charge on the atom and each atom, consistent with the octet satisfaction and equal sharing assumption in single P-F bonds. As a ligand in transition metal complexes, the π-backbonding interaction with PF₃ strengthens its binding to low-oxidation-state metals, rendering it a strong π-acceptor comparable to carbon monoxide (CO). This similarity arises from the effective overlap between metal d-orbitals and the low-lying acceptor orbitals of PF₃, which enhances metal-ligand π-bonding and stabilizes electron-rich complexes. The first ionization energy of PF₃ is 11.65 ± 0.07 eV, corresponding to the removal of an electron from the highest occupied molecular orbital, which is predominantly the phosphorus lone pair orbital.

Physical properties

Thermodynamic data

Phosphorus trifluoride (PF₃) is a colorless, reactive gas with a molar mass of 87.97 g/mol. Its density is 3.91 g/L at standard temperature and pressure (STP). The compound exhibits low phase transition temperatures, with a melting point of −151.5 °C and a boiling point of −101.8 °C, reflecting its volatility as a gas under ambient conditions. The (ΔH_f°) for gaseous PF₃ is −958.44 kJ/mol at 298 . Thermodynamic functions at 298 include a constant-pressure (C_p) of 58.7 J/mol· and a standard (S°) of 273.1 J/mol·. These values are derived from spectroscopic data and equilibrium measurements, with heat capacity modeled using the Shomate equation for temperatures from 298 to 6000 : C_p^\circ = A + B t + C t^2 + D t^3 + \frac{E}{t^2} where t = T/1000 (T in K), and parameters for 298–1000 K are A = 39.66369, B = 110.8434, C = −108.4355, D = 37.88286, E = −0.480131 (in J/mol·K). PF₃ has a critical temperature of 271 K (−2.05 °C) and a critical pressure of 4.33 MPa, indicating moderate conditions for liquefaction beyond its boiling point. Its vapor pressure follows a typical curve for low-boiling fluorides, rapidly increasing above the boiling point to reach atmospheric pressure at −101.8 °C, though exact equations are available in thermochemical compilations for engineering applications.
PropertyValueConditionsSource
Molar mass87.97 -NIST Webbook
Density3.91 ChemicalBook
Melting point−151.5 °C1 ChemicalBook
Boiling point−101.8 °C1 ChemicalBook
ΔH_f°−958.44 298 , gasNIST-JANAF
C_p58.7 J/·298 , gasNIST-JANAF
273.1 J/·298 , gasNIST-JANAF
Critical temperature271 -LookChem
Critical pressure4.33 -LookChem

Spectroscopic data

Phosphorus trifluoride (PF₃) exhibits characteristic spectroscopic features that aid in its identification and structural analysis. In (NMR) , the ³¹P NMR of PF₃ is reported at approximately 97 downfield from the external reference of 85% H₃PO₄ in . This value reflects the deshielding effect of the electronegative atoms on the nucleus, placing PF₃ within the typical range for trivalent phosphorus halides. Infrared (IR) reveals active vibrational modes associated with the P-F bonds. The asymmetric P-F stretching mode (ν₃, E ) appears at 860 cm⁻¹ in the gas phase, while the symmetric P-F stretching mode (ν₁, A₁ ) is observed near 892 cm⁻¹. The symmetric deformation (ν₂, A₁) occurs at 487 cm⁻¹, and the degenerate deformation (ν₄, E) at 344 cm⁻¹. These frequencies confirm the C₃ᵥ pyramidal , with the IR-active modes (A₁ and E) showing strong due to changes during vibration. Raman spectroscopy complements IR data by highlighting symmetric modes. The symmetric P-F stretch (ν₁) is prominent at 890 cm⁻¹ in the liquid phase, with the symmetric deformation (ν₂) at 486 cm⁻¹. The degenerate stretch (ν₃) appears weaker at 840 cm⁻¹, while the degenerate deformation (ν₄) is not prominently observed in Raman spectra. These Raman-active bands (A₁ and E symmetries) arise from polarizability changes, providing insight into the molecule's bonding without IR-inactive overlaps. Ultraviolet-visible (UV-Vis) of PF₃ in the gas phase shows primarily in the (VUV) region, with electronic transitions beginning around 9 (approximately 138 ) and extending to 20 (62 ). These absorptions correspond to excitations from the highest occupied to antibonding orbitals, involving σ* and π* character, and are typical for fluorinated phosphorus compounds lacking visible light . provides precise structural parameters for PF₃. in the yields an P-F (r_e) of 1.563 ± 0.002 Å and a (∠FPF) of 96°53' ± 41', confirming the trigonal pyramidal with C₃ᵥ . These values, derived from rotational constants and centrifugal distortion analysis, align with the influence of the phosphorus on the geometry.90139-6)

Synthesis

Laboratory preparation

Phosphorus trifluoride can be prepared in the laboratory via halogen reactions, such as the reaction of with zinc difluoride in a sealed vessel. $2 \mathrm{PCl_3} + 3 \mathrm{ZnF_2} \rightarrow 2 \mathrm{PF_3} + 3 \mathrm{ZnCl_2} This method typically employs a steel reactor heated to 200–300°C for several hours to facilitate the exchange. One established procedure involves heating the mixture at 250°C for 24 hours, yielding gaseous PF<sub>3</sub> that is collected and separated from solid byproduct. An alternative laboratory route utilizes the direct reaction of white phosphorus with anhydrous hydrogen fluoride under autogenous pressure. \mathrm{P_4 + 12 HF \rightarrow 4 PF_3 + 6 H_2} The reaction proceeds exothermically at 180–220°C, necessitating controlled addition of phosphorus to elemental red or white forms to maintain temperature and prevent side reactions; alkali or alkaline earth fluorides may be added as catalysts to enhance conversion. This approach requires specialized equipment to handle the corrosive HF and generated hydrogen gas. Following synthesis by either method, PF<sub>3</sub> is purified through under reduced pressure or by selective cold trapping, such as at −95°C to isolate the gas from higher-boiling impurities like unreacted halides or oxyfluorides. Laboratory-scale yields generally range from 70–90%, with the HF method achieving up to 95% after , though purity depends on rigorous exclusion of moisture and oxygen to avoid or oxidation. One early laboratory method involves the of with antimony trifluoride in a sealed at 150–200 °C for 6–8 hours, yielding 70–80% PF<sub>3</sub>.

Industrial production

The primary method for industrial production of phosphorus trifluoride (PF₃) involves the fluorination of (PCl₃) with () in specialized reactors designed for efficient gas-phase s. This process typically occurs in flow reactors where PCl₃ and are continuously introduced into a reaction zone containing a carbon-based catalyst or packing material to promote the exchange, yielding PF₃ gas as the main product. The operates at controlled temperatures to optimize yield and minimize side reactions, with the discharged PF₃ collected and purified through or . Alternative approaches employ fluoride salts, such as anhydrous zinc fluoride (ZnF₂), reacted with PCl₃ in integrated reactor systems equipped with cooling and capabilities to achieve high-purity output while reducing environmental impact through simpler byproduct handling. Byproducts like (HCl) from these fluorination reactions are managed via scrubbing systems using alkaline solutions or adsorbents to neutralize and remove acidic gases before venting, ensuring compliance with emission standards. Production occurs on a modest scale tailored to specialty gas markets, with individual facilities often having capacities of 50–200 tons per year to meet demand from niche applications without excess inventory. Recent advancements post-2020 have emphasized ultra-high purity variants (>99.999%) for processing, achieved through enhanced and impurity removal techniques in continuous flow setups to support precision and deposition requirements.

Chemical properties

Reactivity with water and oxidants

Phosphorus trifluoride undergoes hydrolysis with water, albeit at a slow rate compared to other phosphorus trihalides like PCl₃, due to the high electronegativity of fluorine, which strengthens the P-F bonds and reduces the electrophilicity of the phosphorus center. The reaction produces phosphorous acid and hydrogen fluoride: \ce{PF3 + 3 H2O -> H3PO3 + 3 HF} PF₃ is susceptible to oxidation by halogens, leading to the formation of mixed phosphorus halides. For example, it is oxidized by halogens such as bromine. At high temperatures, PF₃ reacts with oxygen, forming phosphorus oxyfluoride (POF₃): \ce{2 PF3 + O2 -> 2 POF3} PF₃ is stable to glass at room temperature but attacks it above 200 °C. Thermal decomposition of PF₃ is endothermic and occurs at high temperatures (>600 °C), following: \ce{4 PF3 -> P4 + 6 F2} This equilibrium favors the reactants under standard conditions, as indicated by the positive enthalpy change of +1578 kJ.

Coordination chemistry

Phosphorus trifluoride (PF₃) serves as a versatile ligand in coordination chemistry, particularly with transition metals in low oxidation states, due to its strong σ-donor and π-acceptor properties. It forms stable tetrahedral complexes such as Ni(PF₃)₄ and Pd(PF₃)₄, which are synthesized by direct reaction of the metal or its precursors with PF₃ under pressure, often in the presence of catalysts like iodine. These complexes are notable because their carbonyl analogs, such as Pd(CO)₄, are unstable or nonexistent, highlighting PF₃'s ability to stabilize zerovalent metals through enhanced back-bonding. Similarly, monosubstituted derivatives like Cr(CO)₅(PF₃) are readily formed, maintaining an 18-electron configuration around the metal center. Substitution reactions exemplify PF₃'s reactivity as a , where it displaces carbonyl groups in metal carbonyls stepwise. For instance, Ni(CO)₄ reacts with PF₃ to yield Ni(CO)₃(PF₃) + , and further substitution leads to Ni(PF₃)₄, proceeding via associative or dissociative mechanisms depending on conditions. The M–PF₃ bonds in these complexes are generally stronger than M–CO bonds, attributed to PF₃'s superior π-acceptor capability, which allows greater transfer from the metal d-orbitals to the ligand's low-lying σ* orbitals. This electronic effect, combined with PF₃'s relatively small steric profile (similar to ), facilitates compliance with the in both homoleptic and mixed-ligand systems, promoting stability in octahedral and tetrahedral geometries. In catalytic contexts, PF₃-substituted complexes enhance processes by modulating the metal's . For example, complexes bearing PF₃ s, such as variants of [Mn(CO)₃(PF₃)(PR₃)₂]⁺, promote CO₂ to through stabilized intermediates and facilitated heterolytic H₂ cleavage, outperforming σ-donor analogs due to PF₃'s π-acceptor strength. This role underscores PF₃'s utility in fine-tuning electronic properties for selective , though its limits widespread industrial adoption.

Applications

Use as a ligand

Phosphorus trifluoride (PF₃) serves as a versatile in organometallic synthesis, particularly for forming volatile, fluorinated complexes that facilitate purification and handling in vapor-phase applications. A seminal example is the zerovalent complex Ni(PF₃)₄, first synthesized in 1951 by reaction of with PF₃, which exists as a volatile liquid at and exhibits high thermal stability up to 100 °C. This compound's fluorinated nature enhances its volatility compared to analogous complexes, enabling its use in precursors for thin films. In the , John F. Nixon and coworkers advanced the coordination chemistry of PF₃ through the direct of tetrakis(fluorophosphine) complexes of zerovalent , demonstrating PF₃'s ability to stabilize low-oxidation-state metals via strong π-backbonding akin to . These efforts highlighted PF₃'s advantages over traditional ligands, including superior volatility—stemming from its low molecular weight and non-hydrogen-bonding substituents—and enhanced thermal , which prevents during and allows access to air-sensitive, fluorinated not feasible with bulkier PR₃ ligands. PF₃ has found application in , notably for olefin and reactions, where its π-acidity promotes facile CO insertion and migration. Specific examples include analogs of for , such as RhH(PF₃)(PPh₃)₃, prepared by substitution into the parent and active for selective of terminal olefins at and temperature. This mixed-ligand complex leverages PF₃'s π-acceptor strength to accelerate of H₂ while maintaining the steric profile of for substrate binding. Overall, PF₃'s unique properties have positioned it as a specialized in research-oriented , though its toxicity limits broader industrial adoption.

Industrial applications

Phosphorus trifluoride (PF₃) serves as a key precursor in (CVD) processes for phosphorus doping in manufacturing, enabling the introduction of phosphorus atoms into wafers to create n-type with controlled electrical properties. This application leverages PF₃'s ability to decompose under or thermal conditions, providing a stable source of phosphorus for epitaxial growth and precise doping levels essential for performance. In advanced , PF₃ is employed in cryo-etching and techniques, where it facilitates high etch selectivity and minimal surface damage. During , PF₃ acts as a source gas, allowing targeted doping to adjust concentrations in silicon-based materials for enhanced efficiency. Cryo-etching with PF₃, often at sub-zero temperatures, improves pattern fidelity by reducing roughness and sidewall erosion in complex 3D structures like FinFETs. PF₃ also plays a role in of silicon-based materials, functioning as a source to selectively remove layers during . In these processes, PF₃ dissociates in to generate reactive species that etch or polysilicon with high rates and selectivity, critical for defining intricate circuit patterns. Additionally, PF₃ serves as a fluorinating agent in the of fluorinated compounds, contributing to the of materials used in various industrial sectors. The demand for PF₃ has grown significantly since 2020, driven by the expansion of production for infrastructure and (as of 2025), with the global market projected to increase at a exceeding 5% through 2030. This surge reflects the gas's indispensability in scaling advanced chip technologies, where high-purity PF₃ ensures yield improvements in high-volume manufacturing.

Safety and toxicology

Biological effects

Phosphorus trifluoride (PF₃) exerts its primary toxic effects through coordination with the iron atom in , forming a stable complex that prevents oxygen binding and transport, akin to the mechanism of . This binding affinity disrupts oxygen delivery to tissues, leading to systemic and potentially fatal asphyxiation even at low exposure levels. In addition to its direct interaction with hemoglobin, PF₃ hydrolyzes in moist environments to produce hydrogen fluoride (HF), which acts as a corrosive agent causing severe irritation and burns to the skin, eyes, and mucous membranes upon contact. Inhalation of PF₃ can induce toxic pneumonitis and pulmonary edema due to inflammatory responses in the lungs, exacerbating respiratory distress. Acute toxicity data indicate high potency via , with an LC₅₀ of 218 for 4 hours in rats, classifying PF₃ as if inhaled at concentrations above this threshold. Another reported value is 433 for 1 hour in rats, underscoring its extreme in gaseous form. exposure to PF₃ may lead to fluorosis due to accumulated ions released via , potentially causing skeletal calcification.

Handling and precautions

Phosphorus trifluoride (PF₃) must be handled in well-ventilated areas or under fume hoods to prevent exposure, with all equipment kept scrupulously dry to avoid reactions with moisture that generate . It is stored in high-pressure cylinders constructed from compatible materials such as mild steel, , , or , maintained upright with valve protection caps in place, in cool (below 52°C), dry, well-ventilated, non-combustible areas away from incompatibles like or acids; cylinders should be segregated from full and empty ones, and stored under an inert atmosphere such as with low moisture and oxygen content (less than 5 each) to minimize decomposition. Personal protective equipment (PPE) is essential and includes tightly fitting safety goggles or a , chemical-resistant gloves and clothing, and fully encapsulating vapor-protective suits for potential high-exposure scenarios; respiratory protection requires NIOSH/MSHA-approved full-face respirators with appropriate cartridges for routine use when exposure may exceed limits, escalating to positive-pressure supplied-air respirators or (SCBA) during emergencies or entry. In case of fire, PF₃ itself is non-flammable, so use dry chemical, , or dry sand extinguishers appropriate to surrounding materials, avoiding water streams that could exacerbate or generate hazardous byproducts; for spills or leaks, evacuate the area, ventilate thoroughly, stop the flow if safe to do so without direct contact, and neutralize any resulting residues with or before absorption with inert materials for disposal. PF₃ is classified as a compressed toxic and corrosive gas under UN 3304 (Compressed gas, toxic, corrosive, n.o.s. (Phosphorus trifluoride)), with 2.3 and 8, requiring specialized protocols including placarding and documentation per regulations. Occupational exposure limits include an OSHA (PEL) of 2.5 mg/m³ (8-hour time-weighted average, as ) and an ACGIH (TLV) of 2.5 mg/m³, with monitoring recommended to ensure levels remain below these thresholds. Due to its binding to and impairment of oxygen , akin to , strict adherence to these precautions is critical to prevent acute respiratory toxicity.

References

  1. [1]
    PHOSPHORUS TRIFLUORIDE | 7783-55-3 - ChemicalBook
    Jul 4, 2025 · PHOSPHORUS TRIFLUORIDE (CAS 7783-55-3) information, including chemical properties, structure, melting point, boiling point, density, ...
  2. [2]
    PF3 properties
    Abstract. Phosphorus trifluoride (PF₃) is a colorless, odorless, highly toxic inorganic compound with the molecular formula PF₃ and molar mass of 87.97 ...
  3. [3]
    US3387935A - Preparation of phosphorus tri-fluoride - Google Patents
    Phosphorus trifluoride is prepared by the reaction of elemental phosphorus with liquid, anhydrous hydrogen fluoride under autogenous pressure at 180 to 220 C.
  4. [4]
    Phosphorus Trifluoride Substitution Compounds of Iron Pentacarbonyl
    This article is cited by 44 publications. Jianming Deng, Chaoyang Wang, Qian-shu Li, Yaoming Xie, R. Bruce King, and Henry F ...
  5. [5]
    Angular-overlap interpretation of .sigma. and .pi. bonding of ...
    Bonding and energetics of phosphorus (III) ligands in transition metal complexes. Coordination Chemistry Reviews 1994, 135-136 , 737-807. https://doi.org ...
  6. [6]
    Phosphorous trifluoride co-gas for carbon implants - Google Patents
    The use of phosphorus trifluoride reduces the formation of carbon deposits by forming CFx and CO gases that can be easily pumped from the chamber, thereby ...
  7. [7]
    [PDF] SAFETY DATA SHEET - Fisher Scientific
    Mar 30, 2024 · Melting Point/Range. -151.5 °C / -240.7 °F. Boiling Point/Range. -101.5 °C / -150.7 °F. Flash Point. No information available. Evaporation Rate.
  8. [8]
    inversion of NH3, NH2F, NHF 2' NF 3 and PH3, PH2F, PHF2, PF3
    on the bond angle of ammonia. The lone pairs are mainly formed by s orbitals ... 96.3 ± 0.5. 114.67 (114.11). 124.62 (123.38). aBond lengths in A, bond ...
  9. [9]
    Equilibrium Structures of the Phosphorus Trihalides PF 3 and PCl 3 ...
    Jun 10, 2019 · The bond angles in PH2 and PH3 decrease by 0.066° and 0.087°, respectively, whereas the angle in PF2 increases by 0.019°. To examine basis set ...
  10. [10]
    CCCBDB Experimental bond lengths 3
    List of experimental bond lengths for bond type rFP ; rFP, F3PO, Phosphoryl fluoride, 1.524 ; rFP, PF · Phosphorus trifluoride, 1.561.
  11. [11]
    Dipole Moment Studies. VII. Dipole Moments of the ... - AIP Publishing
    Dec 15, 1972 · The value for PF3 is in reasonable agreement with the microwave value [R. G. Schulman et al., Phys. Rev. 78, 145 (1950)], of 1.025±0.009 D.
  12. [12]
    Metal-phosphine bonding revisited. .sigma.-Basicity, .pi.-acidity, and ...
    σ-Donor and π-Acceptor Properties of Phosphorus Ligands: An Insight from the Natural Orbitals for Chemical Valence.
  13. [13]
    Phosphorus trifluoride | F3P | CID 62665 - PubChem
    Phosphorus trifluoride | F3P | CID 62665 - structure, chemical names, physical and chemical properties, classification, patents, literature, ...
  14. [14]
  15. [15]
    Phosphorus trifluoride - the NIST WebBook
    Phosphorus trifluoride · Formula: F3P · Molecular weight: 87.968972 · IUPAC Standard InChI: InChI=1S/F3P/c1-4(2)3. Copy · IUPAC Standard InChIKey: WKFBZNUBXWCCHG- ...
  16. [16]
  17. [17]
    Phosphorus trifluoride
    ### Thermodynamic Data for Phosphorus Trifluoride (PF₃)
  18. [18]
    Cas 7783-55-3,PHOSPHORUS TRIFLUORIDE - LookChem
    Used in Chemical Industry: Phosphorus trifluoride is used as a precursor in the production of various phosphorus-containing compounds. Its reactivity with other ...<|control11|><|separator|>
  19. [19]
    Phosphorus trifluoride
    **Phase Change Data for Phosphorus Trifluoride (PF₃)**
  20. [20]
    [PDF] Tables of molecular vibrational frequencies, consolidated volume I
    Key words: Fundamental frequencies; infrared spectra; polyatomic molecules; Raman spectra; ... PF3. 17. Phosphorus trichloride,. PCI3. 18. Arsine,. ASH3. 18.
  21. [21]
    The Preparation and Properties of Phosphorus Trifluoride-Borane ...
    The Preparation and Properties of Phosphorus Trifluoride-Borane and Phosphorus ... Phosphane–boranes: synthesis, characterization and synthetic applications.
  22. [22]
    [PDF] Volume 4 - INORGANIC SYNTHESES - University of Michigan
    the preparation of phosphorus(II1) fluoride (synthesis 49) ; however, if ... RUFF: “Die Chemie des Fluors,” p. 27, Springer-Verlag, Berlin, 1920. 3 ...
  23. [23]
    1. wo2023168597 - method for producing phosphorus trifluoride and ...
    Sep 14, 2023 · The method for producing phosphorus trifluoride comprises: a step of introducing phosphorus trichloride and hydrogen fluoride into a first ...
  24. [24]
    Technology for preparing phosphorus trifluoride by adopting ...
    The invention discloses a technology for preparing phosphorus trifluoride by adopting the reaction of the phosphorus trifluoride and zinc fluoride.
  25. [25]
    Public Notice of Environmental Impact Assessment of the Electronic ...
    a 58.88t/a phosphorus trifluoride packaging production line will be set up ... A total of 170 tons of new production capacity. Name and contact ...
  26. [26]
    Phosphorus Trifluoride (PF3) Market - PW Consulting -
    Feb 16, 2025 · Supply chain dynamics are underscored by PF3's **high purity requirements** (≥99.999%) and limited global production capacity. Over 80% of PF3 ...
  27. [27]
    First principles computational study on hydrolysis of hazardous ...
    Jan 5, 2018 · It is found that the water molecules play a key role as a catalyst significantly lowing activation barrier of the hydrolysis via transferring ...
  28. [28]
    Phosphorus trifluoride - Wikipedia
    Phosphorus trifluoride ; Appearance, colorless gas ; Density, 3.91 g/L, gas ; Melting point, −151.5 °C (−240.7 °F; 121.6 K) ; Boiling point, −101.8 °C (−151.2 °F; ...
  29. [29]
    Phosphorus trifluoride - chemeurope.com
    It is highly toxic and it reacts slowly with water. Its main use is as a ligand in metal complexes. As a ligand it parallels carbon monoxide in metal carbonyls, ...
  30. [30]
    [PDF] RUSSIAN CHEMICAL REVIEWS
    In order to prepare Ni(PF3)4 and Pd(PF3)4 Kruck et al.5 8 used the direct reaction of the metals with phosphorus trifluoride in the presence of iodine as ...
  31. [31]
    Catalytic Hydrogenation of CO2 by Manganese Complexes
    Here, we find that the σ-donor ligands (PMe3/PH3) favor the hydride transfer, whereas the π-acceptor ligands (CO/PF3) favor the heterolytic H2-cleavege. The ...
  32. [32]
    Phosphorus–fluorine compounds. Part XIV. Direct syntheses of ...
    Direct syntheses of tetrakis(fluorophosphine) complexes of zerovalent nickel. John F. Nixon and Michael D. Sexton. Abstract.
  33. [33]
    Trifluorophosphine Complexes of Transition Metals - ScienceDirect
    Nixon. Show more. Add to Mendeley. Share. Cite. https://doi.org/10.1016/S0898 ... PF3 can stabilize novel systems which have no precedent with other phosphine ...
  34. [34]
    Catalytic hydrogenation and isomerisation of terminal olefins by ...
    The trifluorophosphine complex RhH(PF3)(PPh3)3, the analogue of the well-known homogeneous catalyst RhH(CO)(PPh3)3, has been synthesised and found to be a ...
  35. [35]
    Phosphorus Trifluoride PF3 Gas - China Isotope Development
    Phosphorus trifluoride PF3 can act as a fluorinating agent in the synthesis of fluorinated compounds, particularly in pharmaceuticals and agrochemicals. 5 ...
  36. [36]
    Phosphorus Trifluoride (PF₃) | Gases | USD - Entegris
    An ultra-pure precursor gas used for cryo etch, chemical vapor deposition and ion implantation applications. High purity to improve etch rates; Stable PF3 ...
  37. [37]
    Phosphorus Trifluoride PF3 Lewis Structure & Its Applications ...
    3. Semiconductor Industry: Etching: Phosphorus trifluoride PF3 is used in plasma etching processes to selectively remove materials from semiconductor wafers.
  38. [38]
    Phosphorus Trifluoride: The Essential Gas for Next-Generation ...
    Aug 21, 2025 · Molecular identity and basic properties: PF3 is a trigonal pyramidal molecule consisting of a phosphorus center bonded to three fluorine atoms.
  39. [39]
    How Fluorine and Fluoride Gases are Used in Semiconductor ...
    Oct 23, 2024 · Phosphorus trifluoride (PF3) is used in semiconductor manufacturing primarily as an etching and cleaning agent. PF3 is applied in plasma etching ...
  40. [40]
    Phosphorus Trifluoride (PF3) Unlocking Growth Opportunities
    Rating 4.8 (1,980) Jul 4, 2025 · The Phosphorus Trifluoride (PF3) market is experiencing robust growth, driven by increasing demand in the semiconductor industry, particularly ...
  41. [41]
    Phosphorus Trifluoride (PF3) Market Share Driven - openPR.com
    Oct 15, 2025 · The Phosphorus Trifluoride (PF3) Market is witnessing notable market growth, fueled by rising demand in the semiconductor, chemical, and ...
  42. [42]
    [PDF] PHOSPHOROUS TRIFLUORIDE - Material Safety Data Sheet
    Hazardous Polymerization. Hazardous polymerization does not occur. 11. TOXICOLOGICAL INFORMATION. Acute Toxicity. LD50 Oral: No information available. LD50 ...Missing: biological | Show results with:biological
  43. [43]
    Phosphorus trifluoride - Hazardous Agents - Haz-Map
    A strong skin, eye, and mucous membrane irritant; Inhalation my cause pulmonary edema; [Merck Index] A corrosive substance that can cause injury to the skin ...
  44. [44]
    [PDF] Phosphorus Trifluoride
    Dec 10, 2018 · Wear safety glasses with side shields. ... : UN3308 Liquefied gas, toxic, corrosive, n.o.s. (Phosphorus Trifluoride) Inhalation Hazard Zone.
  45. [45]
    Developmental fluoride neurotoxicity: an updated review - PMC
    Dec 19, 2019 · The recent epidemiological results support the notion that elevated fluoride intake during early development can result in IQ deficits that may be considerable.
  46. [46]
    Fluoride Exposure and Children's IQ Scores: A Systematic Review ...
    Accumulating evidence suggests that fluoride exposure may affect brain development. A 2006 report from the National Research Council (NRC) concluded that high ...Missing: phosphorus trifluoride
  47. [47]
    [PDF] Ereztech LLC P3553 Safety Data Sheet
    Nov 27, 2020 · Product is moisture sensitive and releases toxic and corrosive gases when exposed to moisture/water.