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Semiconductor

A semiconductor is a material with electrical conductivity between that of a conductor and an insulator, such as silicon, whose conductivity can be precisely tuned by external factors like temperature, light, or the introduction of impurities.^[1] This tunability arises from the material's atomic structure, allowing electrons to move more freely under controlled conditions, which distinguishes semiconductors from metals (high conductivity) and insulators (negligible conductivity).^[2] The defining physical property of semiconductors is their energy band gap, the minimum energy required to excite an electron from the valence band—where electrons are bound to atoms—to the conduction band, where they can contribute to electrical current.^[3] For most semiconductors, this band gap ranges from about 0.5 to 3 electron volts (eV), enabling applications where conductivity can be switched on or off, unlike the near-zero band gap in conductors or the wide gaps exceeding 5 eV in insulators.^[4] Doping, the process of intentionally adding trace elements, further modifies carrier concentration: n-type doping introduces extra electrons for negative charge carriers, while p-type doping creates "holes" for positive carriers, forming the basis of devices like diodes and transistors.^[5] Common semiconductor materials include elemental types like silicon (Si), which has a band gap of 1.1 eV and dominates due to its abundance, thermal stability, and ease of fabrication into integrated circuits; germanium (Ge), with a narrower 0.67 eV band gap offering higher electron mobility for faster signal processing; and compound semiconductors like gallium arsenide (GaAs), featuring a 1.43 eV band gap, superior electron mobility (six times that of silicon), and direct band gap for efficient light emission in optoelectronics.^[6] Other notable compounds include indium phosphide (InP) for high-frequency applications and silicon carbide (SiC) for high-power, high-temperature environments due to its wide 3.2 eV band gap.^[7] These materials are typically crystalline, with silicon wafers serving as the substrate for most microelectronic manufacturing.^[8] Semiconductors underpin virtually all modern electronics, enabling the miniaturization of components into billions of transistors per chip for computing, communications, and consumer devices.^[1] Key applications include transistors for amplification and switching in integrated circuits, diodes for rectification and LEDs for displays and lighting, photovoltaic cells for solar energy conversion, and sensors in healthcare and transportation systems.^[2] The global semiconductor industry, valued at $627.6 billion in 2024, supports emerging technologies like artificial intelligence, the Internet of Things, and quantum computing, while facing challenges such as supply chain vulnerabilities and the need for advanced nanoscale fabrication.^[9]

Definition and Properties

Electrical Conductivity

Semiconductors are materials with electrical conductivity intermediate between that of conductors and insulators, typically spanning a range of $10^{-8} to $10^{2} S/cm at room temperature.^[10] This positions them distinctly from metals, which exhibit high conductivities on the order of $10^{5} to $10^{7} S/cm due to abundant free electrons, and from insulators, which have conductivities below $10^{-12} S/cm owing to a large energy barrier preventing charge carrier excitation.^[8] A defining characteristic of semiconductors is their tunable electrical behavior, particularly the strong dependence on temperature and impurities. In pure, intrinsic semiconductors, conductivity increases exponentially with temperature because thermal energy excites electrons across the band gap into the conduction band, generating charge carriers. This contrasts sharply with metals, where rising temperature enhances electron-phonon scattering, thereby decreasing conductivity.^[8]^[11] The temperature dependence for intrinsic conductivity is described by the relation

\sigma = \sigma_0 \exp\left( -\frac{E_g}{2kT} \right),

where \sigma is the conductivity, \sigma_0 is a pre-exponential factor, E_g is the band gap energy, k is Boltzmann's constant, and T is the absolute temperature.^[12] Insulators, by comparison, maintain negligible conductivity across typical temperature ranges due to their much larger E_g, which suppresses thermal excitation.^[8] Impurities play a critical role in modulating semiconductor conductivity without relying on elevated temperatures, enabling precise control essential for electronic devices. By intentionally introducing dopant atoms—such as phosphorus for n-type or boron for p-type silicon—the carrier concentration can be increased dramatically, shifting the material from insulating-like behavior at low temperatures to conductive states at room temperature.^[12] This doping process alters the Fermi level and carrier density, allowing conductivities to reach values up to $10^{2} S/cm in heavily doped samples.^[13] A representative example is silicon, the most widely used semiconductor material. Its intrinsic conductivity at 300 K is approximately $4 \times 10^{-4} S/m (equivalent to $4 \times 10^{-6} S/cm), reflecting limited thermal generation of carriers across its 1.12 eV band gap.^[13] As temperature rises, conductivity escalates rapidly; for instance, a modest increase to around 400 K can boost it by more than an order of magnitude due to the exponential term in the conductivity formula.^[12]

Optical Properties

Semiconductors interact with light primarily through processes governed by their electronic band structure, particularly the bandgap energy E_g. When photons with energy \hbar \omega \geq E_g are absorbed, electrons are excited from the valence band to the conduction band, generating electron-hole pairs that enhance electrical conductivity, a phenomenon known as photoconductivity.^[14] This absorption is characterized by the absorption coefficient \alpha(\omega), which for direct transitions follows \alpha(\omega) \propto \sqrt{\hbar \omega - E_g}/\hbar \omega near the band edge, while indirect transitions require phonon assistance and exhibit \alpha(\omega) \propto (\hbar \omega - E_g \pm \hbar \omega_q)^2.^[14] Light emission in semiconductors arises from radiative recombination, where an electron in the conduction band recombines with a hole in the valence band, releasing a photon with energy approximately equal to E_g. This process underpins photoluminescence, observed when absorbed light excites carriers that subsequently recombine, and electroluminescence, which occurs in forward-biased p-n junctions where injected carriers recombine radiatively.^[14] The efficiency of emission depends on the bandgap type: direct bandgap semiconductors, such as gallium arsenide (GaAs) with E_g \approx 1.42 eV (at 300 K), enable momentum-conserving vertical transitions for efficient radiative recombination, whereas indirect bandgap materials like silicon (Si) with E_g \approx 1.12 eV require phonon involvement to conserve crystal momentum, resulting in lower quantum efficiency.^[14]^[15] Quantum efficiency, defined as the ratio of radiative recombination events to total recombinations, is thus significantly higher in direct bandgap materials, often approaching unity under optimal conditions.^[14] The wavelength \lambda of emitted or absorbed light is related to the bandgap by \lambda = hc / E_g, where h is Planck's constant and c is the speed of light; for instance, this yields \lambda \approx 870 nm for GaAs and \lambda \approx 1100 nm for Si at room temperature.^[15] This principle enables light-emitting diodes (LEDs) based on direct bandgap semiconductors to emit across visible to infrared wavelengths, while solar cells exploit absorption of photons above E_g to generate photocurrent via the photovoltaic effect, with indirect bandgap materials like Si being suitable due to their adequate absorption despite lower emission efficiency.^[14]^[16]

Thermal Properties

Semiconductors exhibit relatively high thermal conductivity compared to insulators but lower than metals, primarily due to phonon transport mechanisms where lattice vibrations carry heat through the crystal structure. For instance, silicon has a thermal conductivity of approximately 150 W/m·K at room temperature, while gallium arsenide (GaAs) is around 50 W/m·K, allowing effective heat dissipation in electronic devices to prevent overheating.^[17]^[18] This phonon-dominated transport is influenced by factors such as phonon mean free path and scattering, which can be engineered in nanostructures to reduce conductivity for specific applications like thermoelectrics.^[17] Thermoelectric effects in semiconductors enable the conversion between thermal and electrical energy, with the Seebeck coefficient (S) quantifying the voltage generated across a temperature gradient. The performance of such materials is evaluated by the dimensionless figure of merit ZT, defined as:

ZT = \frac{S^2 \sigma T}{\kappa}

where \sigma is the electrical conductivity, T is the absolute temperature, and \kappa is the thermal conductivity.^[19] For practical thermoelectric generators, ZT values exceeding 1 are required to achieve reasonable efficiency, as seen in bismuth telluride (Bi₂Te₃) alloys, which reach ZT ≈ 1 near room temperature due to their optimized balance of high Seebeck coefficients and low thermal conductivity.^[20]^[21] The bandgap energy E_g in semiconductors decreases with increasing temperature, affecting carrier concentrations and device performance; this variation is often described by the Varshni equation:

E_g(T) = E_g(0) - \frac{a T^2}{T + b}

where E_g(0) is the bandgap at 0 K, and a and b are material-specific constants.^[22] These thermal properties also underpin the Peltier effect, where current flow through a semiconductor junction absorbs or releases heat, enabling solid-state cooling without moving parts.^[23] In space applications, Bi₂Te₃-based thermoelectric generators harness waste heat for reliable power generation, as demonstrated in solar thermoelectric systems.^[24]^[25]

Semiconductor Materials

Elemental Semiconductors

Elemental semiconductors are pure elements from Group IV of the periodic table that display semiconducting properties due to their intermediate electrical conductivity between metals and insulators. The primary examples include silicon (Si), germanium (Ge), and gray tin (α-Sn), which form covalent crystals with bandgaps allowing controlled charge carrier excitation at room temperature.^[26]^[27] Silicon, the most widely used elemental semiconductor, has a bandgap energy of 1.12 eV at room temperature and adopts a diamond cubic crystal structure with a lattice constant of 0.543 nm.^[26]^[27] Germanium possesses a smaller bandgap of 0.67 eV and shares the same diamond cubic structure, with a lattice constant of 0.566 nm.^[26]^[28] Gray tin, or α-Sn, exhibits an even narrower bandgap of 0.08 eV and also crystallizes in the diamond cubic form, though it is less stable above 13.2°C and transitions to metallic white tin (β-Sn).^[29] These materials feature strong covalent bonding in a tetrahedral lattice, where each atom bonds to four neighbors, resulting in an indirect bandgap for both silicon and germanium that requires phonon assistance for efficient electron transitions.^[30] Silicon's key advantages include its high abundance, comprising about 27.7% of Earth's crust by weight, and superior thermal stability with a melting point of 1414°C, making it ideal for high-temperature electronics.^[31]^[32] In contrast, germanium offers higher carrier mobilities, with electron mobility reaching 3900 cm²/V·s compared to silicon's 1400 cm²/V·s, enabling faster device operation but at the cost of poorer thermal performance.^[33] Historically, early transistors in the 1940s and 1950s relied on germanium due to its superior electrical properties, but by the mid-1960s, the industry shifted to silicon for its better oxide passivation, higher temperature tolerance up to 200°C, and scalable production, revolutionizing integrated circuits.^[34]^[35] Other elemental cases are rarer; carbon in its diamond allotrope acts as an insulator with a wide bandgap of 5.5 eV, while graphene, a single layer of graphite, behaves as a zero-bandgap semi-metal with linear dispersion and exceptional electron mobility exceeding 200,000 cm²/V·s.^[36]^[37]

Compound Semiconductors

Compound semiconductors are multi-element materials formed by combining elements from different groups of the periodic table, enabling tailored electronic, optical, and thermal properties that surpass those of elemental semiconductors like silicon or germanium. These compounds, particularly binary and ternary varieties, are classified into families such as III-V, II-VI, and others, based on the valence groups of their constituent atoms. Their ability to form direct bandgaps and exhibit high carrier mobilities makes them essential for applications in optoelectronics, high-frequency devices, and power electronics. Unlike single-element semiconductors, compound materials allow for precise bandgap engineering through alloying, which adjusts the energy gap to match specific wavelengths or operational requirements.^[38] III-V compound semiconductors, composed of elements from groups III and V, are widely used due to their direct bandgaps and superior electron mobilities. Gallium arsenide (GaAs), with a bandgap energy of 1.43 eV at room temperature, features a direct bandgap that facilitates efficient light emission and absorption, while its high electron mobility—exceeding 8000 cm²/V·s—enables high-speed radio-frequency (RF) devices such as amplifiers and transistors.^[39] Indium phosphide (InP), with a bandgap of 1.34 eV, also possesses a direct bandgap and is valued for its lattice-matching compatibility with other III-V materials, supporting photonic integrated circuits. Aluminum gallium arsenide (AlGaAs) alloys exemplify bandgap engineering in this family; the composition Al_x Ga_{1-x} As allows the bandgap to vary nearly linearly from 1.43 eV (for x=0, pure GaAs) to 2.17 eV (for x=1, pure AlAs), enabling heterostructures for lasers and detectors.^[40]^[41] II-VI compound semiconductors, formed from group II and VI elements, often exhibit wider bandgaps suitable for visible and ultraviolet applications. Zinc sulfide (ZnS) has a direct bandgap of 3.6 eV, making it ideal for blue light-emitting diodes (LEDs) and phosphors due to its transparency in the visible spectrum and stability. Cadmium telluride (CdTe), with a bandgap of 1.5 eV, is a key material for thin-film solar cells, achieving efficiencies over 20% in photovoltaic devices owing to its optimal absorption of solar radiation and low-cost deposition. However, Cd-based compounds like CdTe raise environmental and health concerns due to cadmium's toxicity, prompting the development of alternatives such as tin-based chalcogenide semiconductors (IV-VI compounds) for optoelectronic uses.^[42]^[43]^[44]^[45] Other notable compound semiconductors include IV-IV types like silicon carbide (SiC) and additional III-V materials such as gallium nitride (GaN). SiC, with a bandgap of 3.2 eV, is an indirect wide-bandgap semiconductor prized for high-power and high-temperature electronics, where it maintains performance up to 600°C due to its high thermal conductivity and breakdown voltage. GaN, featuring a direct bandgap of 3.4 eV, excels in blue LEDs, high-electron-mobility transistors, and power devices, benefiting from its ability to handle voltages over 600 V and operate at elevated temperatures. Wide-bandgap semiconductors exceeding 2 eV, including SiC and GaN, enable operation in harsh environments by reducing thermal generation of carriers and enhancing device reliability. Alloying within these families further tunes properties; for instance, variations in AlGaInP alloys adjust the bandgap from 1.9 eV to 2.2 eV for multijunction solar cells.^[46]^[47]

Preparation Methods

The preparation of semiconductors involves sophisticated techniques to produce high-purity single crystals and thin films, which are critical for minimizing defects and enabling precise electronic properties in devices. These methods focus on controlled growth from melts, vapors, or beams, often achieving impurity levels below parts per billion to ensure optimal performance. Bulk crystal growth methods like the Czochralski and float-zone processes yield large ingots for wafer slicing, while epitaxial techniques such as molecular beam epitaxy and chemical vapor deposition deposit thin layers on substrates for heterostructures. The Czochralski process is the dominant industrial method for growing single-crystal silicon ingots, involving the melting of high-purity polycrystalline silicon in a quartz crucible at approximately 1414°C within an inert atmosphere chamber. A rotating seed crystal is dipped into the melt and slowly withdrawn at rates of 0.5–2 mm/min while rotating at 10–20 rpm, allowing the silicon to solidify at the liquid-solid interface and form a cylindrical ingot with a controlled diameter. Modern facilities produce ingots up to 300 mm in diameter and lengths exceeding 2 meters, supporting the fabrication of wafers for advanced integrated circuits. Impurity concentrations, including unintentional contaminants like oxygen and carbon, are maintained below 10^{12} atoms/cm³ through optimized crucible design, argon gas purging, and magnetic field application to suppress melt convection. Dopants such as boron or phosphorus can be introduced during growth for tailored conductivity. As an alternative to the Czochralski method, the float-zone process offers superior purity for oxygen-sensitive applications by avoiding crucible contact. In this technique, a polycrystalline silicon rod is vertically suspended, and a narrow molten zone (typically 1–2 cm wide) is created using radio-frequency induction heating, with a seed crystal at the bottom to initiate single-crystal growth as the zone travels upward at 1–5 mm/min. This crucible-free approach results in oxygen content below 1 ppma, compared to ~25 ppma in Czochralski silicon, reducing thermal donor formation and improving minority carrier lifetime. Float-zone ingots are limited to diameters under 150 mm due to surface tension constraints but are preferred for high-voltage power devices and research-grade materials. Molecular beam epitaxy (MBE) enables the precise deposition of ultrathin semiconductor layers in an ultra-high vacuum environment (~10^{-10} Torr), where effusive sources evaporate elemental or compound materials as molecular beams toward a heated substrate. Growth occurs at rates of 0.1–1 monolayer per second, allowing atomic-level control over composition and thickness without solvent incorporation. This method excels in fabricating complex heterostructures, such as GaAs/AlGaAs quantum wells, where lattice-matched layers form 2D electron gases with mobilities exceeding 10^6 cm²/V·s at low temperatures. MBE's shuttered sources facilitate abrupt interfaces essential for optoelectronic devices like lasers and high-electron-mobility transistors. Chemical vapor deposition (CVD) grows epitaxial films through the thermal decomposition of gaseous precursors on a substrate, typically at 500–1000°C and pressures of 10–760 Torr. For silicon, silane (SiH_4) serves as the primary precursor, adsorbing onto the surface, desorbing hydrogen, and incorporating silicon atoms to extend the crystal lattice. Growth rates range from 0.1–10 nm/min, depending on temperature and precursor flow, enabling uniform deposition over wafer-scale areas. Variants like low-pressure CVD or plasma-enhanced CVD reduce thermal budgets, while rapid thermal CVD with silane achieves epitaxial silicon at temperatures below 700°C, supporting integration with advanced scaling processes. Zone refining purifies semiconductor feedstocks by exploiting differences in impurity solubility between solid and liquid phases. A narrow molten zone, heated by induction or electron beams, is passed repeatedly along an ingot (e.g., 10–50 passes at 1–5 mm/min), driving impurities toward the end due to segregation coefficients less than 1. This achieves residual impurity levels in the parts-per-billion range, such as reducing metallic contaminants in gallium to below 1 ppb after multiple cycles, which is vital for high-mobility compound semiconductors. The technique is often applied post-initial synthesis to refine elemental materials like silicon or germanium before crystal growth.

Band Theory and Charge Carriers

Energy Bands

In the quantum mechanical description of solids, band theory explains the electronic structure of semiconductors through the formation of energy bands arising from the overlap of atomic orbitals in a periodic crystal lattice. When atoms are brought together to form a solid, the discrete energy levels of isolated atoms split and broaden into continuous bands of allowed energies due to quantum mechanical interactions. In semiconductors, the highest occupied band at absolute zero temperature, known as the valence band, is fully filled with electrons from the valence orbitals, while the next higher band, the conduction band, formed from empty or partially empty atomic orbitals, remains empty. These two bands are separated by a forbidden energy region called the bandgap, with energy width E_g, which prevents free electron movement at low temperatures and underpins the semiconducting behavior.^[48]^[49] The bandgap in semiconductors can be classified as direct or indirect based on the momentum characteristics of electron transitions, as visualized in reciprocal k-space diagrams. In direct bandgap materials, such as gallium arsenide, the conduction band minimum and valence band maximum align at the same wavevector k = 0 (typically at the Brillouin zone center), enabling efficient momentum-conserving optical transitions where an electron can absorb a photon and move vertically in energy without changing its crystal momentum. In contrast, indirect bandgap semiconductors, like silicon, have these extrema at different k points, requiring a phonon to supply or absorb the necessary momentum change during transitions, which makes processes like light emission less efficient. This distinction arises from the symmetry and curvature of the energy dispersion relations E(k) near the band edges.^[50]^[51] The bandgap energy E_g, defined as the difference between the conduction band edge E_c and valence band edge E_v, typically spans 0.1 to 5 eV across common semiconductor materials, distinguishing them from metals (overlapping bands, E_g \approx 0) and insulators (E_g > 5 eV). This energy scale allows thermal or optical excitation of electrons across the gap at room temperature. The value of E_g decreases with increasing temperature due to lattice expansion and electron-phonon interactions; for example, in silicon, the temperature coefficient is approximately -2.4 × 10^{-4} eV/K at 300 K, with E_g narrowing from 1.17 eV at 0 K to 1.12 eV at 300 K.^[26]^[52] In intrinsic (undoped) semiconductors, the Fermi level E_F, which represents the chemical potential of electrons, resides within the bandgap and determines the occupancy of states according to the Fermi-Dirac distribution. For charge neutrality, where electron and hole concentrations are equal, the position is given by

E_F = \frac{E_c + E_v}{2} + \frac{kT}{2} \ln\left(\frac{N_v}{N_c}\right),

where k is Boltzmann's constant, T is temperature, and N_c and N_v are the effective densities of states at the conduction and valence band edges, respectively, defined as N_c = 2 \left( \frac{2\pi m_n^* kT}{h^2} \right)^{3/2} and N_v = 2 \left( \frac{2\pi m_p^* kT}{h^2} \right)^{3/2}, with m_n^* and m_p^* as the electron and hole effective masses, and h as Planck's constant. This placement ensures equal thermal generation of electrons in the conduction band and holes in the valence band.^[49] The distribution of available quantum states within the bands is described by the density of states function g(E), which quantifies the number of electron states per unit energy interval per unit volume. Near the conduction band edge, under the parabolic band approximation, g(E) \propto \sqrt{E - E_c} for E > E_c, arising from the three-dimensional free-electron-like dispersion E(k) \propto k^2. A similar form holds for the valence band, g(E) \propto \sqrt{E_v - E} for E < E_v. This square-root dependence leads to a vanishing density of states at the band edges, influencing carrier concentrations and transport properties.^[53]

Electrons and Holes

In semiconductors, free charge carriers include electrons, which occupy states in the conduction band, and holes, which are vacancies in the valence band that behave as positively charged carriers due to the collective motion of surrounding electrons.^[49] These carriers enable electrical conduction when excited across the band gap.^[54] The effective mass m^* of these carriers arises from the band structure and is defined by the curvature of the energy E versus wavevector k relation near the band edges, given by

m^* = \frac{\hbar^2}{\frac{d^2 E}{dk^2}}.

This parameter accounts for the influence of the crystal lattice on carrier acceleration under an applied field. For electrons, m^* is lighter in gallium arsenide (GaAs) at $0.067 m_e compared to silicon (Si) at $0.26 m_e, where m_e is the free electron mass, leading to differences in transport properties.^[49] Carrier mobility \mu, a measure of how easily carriers move through the material, is expressed as \mu = \frac{[e](/page/E!) \tau}{m^*}, where e is the elementary charge and \tau is the average scattering time between collisions. Mobility is primarily limited by phonon scattering from lattice vibrations and impurity scattering from defects or dopants, with phonon effects dominating at higher temperatures and impurity effects at lower temperatures or higher doping levels.^[55]^[33] Under an applied electric field E, carriers experience a drift velocity, resulting in drift current density J_d = e n \mu E, where n is the carrier density; this describes the field-driven flow of electrons or holes.^[56] Holes generally exhibit lower mobility than electrons owing to their heavier effective mass, which reduces their response to fields. Additionally, carriers can contribute to diffusion current density J_{\text{diff}} = -e D \nabla n due to concentration gradients, where D is the diffusion coefficient related to mobility by the Einstein relation D = \frac{kT}{e} \mu, with k Boltzmann's constant and T temperature.^[57]^[58]^[59]

Generation and Recombination

In semiconductors, thermal generation of charge carriers arises from the excitation of electrons across the bandgap due to thermal energy, producing equal numbers of electrons and holes in intrinsic materials. This process establishes the intrinsic carrier concentration n_i, given by

n_i = \sqrt{N_c N_v} \exp\left( -\frac{E_g}{2kT} \right),

where N_c and N_v are the effective densities of states in the conduction and valence bands, E_g is the bandgap energy, k is Boltzmann's constant, and T is the absolute temperature.^[60] In thermal equilibrium, the generation rate balances the recombination rate, yielding a steady-state carrier density. Recombination processes annihilate electron-hole pairs, with types varying by material and conditions. Radiative recombination, prevalent in direct bandgap semiconductors, occurs when an electron from the conduction band recombines directly with a valence band hole, emitting a photon whose energy approximates E_g. This bimolecular process has a rate R = Bnp, where B is the radiative recombination coefficient and n, p are the electron and hole concentrations; it is inefficient in indirect bandgap materials due to momentum conservation requirements.^[61] Non-radiative recombination includes Shockley-Read-Hall (SRH) and Auger mechanisms. SRH recombination proceeds via mid-gap trap states at defects, where one carrier is captured by the trap before the opposite carrier recombines, dissipating energy as lattice vibrations (phonons). The minority carrier lifetime under SRH dominance is \tau = 1 / (N_t v_{th} \sigma), with N_t the trap density, v_{th} the carrier thermal velocity, and \sigma the capture cross-section; this framework originates from the statistics of trap-mediated processes. Auger recombination involves three carriers: an electron-hole pair recombines, transferring recombination energy to a third carrier that relaxes non-radiatively, becoming prominent at high doping or injection levels.^[62] The carrier lifetime \tau quantifies the average duration excess carriers persist before recombination, influencing diffusion lengths and device efficiency. Minority carrier lifetime is particularly vital for optoelectronic and photovoltaic applications. In silicon, an indirect bandgap semiconductor, high-purity samples exhibit lifetimes of 10 μs to 32 ms, limited mainly by non-radiative paths.^[63] In direct bandgap materials like GaAs, lifetimes are shorter, typically 1–10 ns in lowly doped samples, owing to dominant radiative recombination.^[64] Non-equilibrium conditions, induced by illumination or forward bias, generate excess carriers \delta n and \delta p beyond thermal levels. These excess populations decay exponentially to equilibrium, following \delta n(t) = \delta n(0) \exp(-t / \tau) (and similarly for holes), where \tau is the effective lifetime incorporating all recombination channels.^[65]

Doping and Junctions

Intrinsic and Extrinsic Semiconductors

Semiconductors in their pure form, known as intrinsic semiconductors, exhibit equal concentrations of electrons and holes generated thermally across the bandgap. In these materials, the electron concentration n equals the hole concentration p, both denoted as the intrinsic carrier concentration n_i, typically on the order of $10^{10} cm^{-3} for silicon at room temperature.^[49] This balance arises from thermal excitation promoting electrons from the valence band to the conduction band, leaving behind an equal number of holes, with no intentional impurities present to alter the carrier populations.^[49] Extrinsic semiconductors, in contrast, are intentionally doped with impurities to control carrier concentrations and type, enabling tailored electrical properties for devices. Donor impurities from group V elements, such as phosphorus (P) in silicon, introduce extra electrons by providing loosely bound states just below the conduction band edge, resulting in n-type material where the electron concentration n \approx N_d (donor density) dominates over holes.^[49] Acceptor impurities from group III elements, like boron (B) in silicon, create states just above the valence band edge that accept electrons, generating holes and yielding p-type material where the hole concentration p \approx N_a (acceptor density) predominates.^[49] Doping shifts the Fermi level E_F to reflect the majority carrier type while maintaining overall charge neutrality. In n-type semiconductors, E_F moves closer to the conduction band edge E_c, whereas in p-type, it approaches the valence band edge E_v; for intrinsic cases, E_F resides near the midpoint of the bandgap.^[66] Charge neutrality is enforced by the relation n + N_a^- = p + N_d^+, where N_a^- and N_d^+ represent ionized acceptors and donors, respectively, ensuring the total positive and negative charges balance.^[49] At low to moderate doping levels (non-degenerate regime), carriers follow Boltzmann statistics, but high doping concentrations exceeding $10^{18} cm^{-3} lead to degenerate semiconductors, where the Fermi level enters the conduction or valence band, imparting metallic-like conductivity and causing bandgap narrowing due to impurity band merging with the host bands. Compensation doping, involving the introduction of both donor and acceptor impurities, allows precise control of net carrier concentration by mutual neutralization, useful for fine-tuning conductivity in devices.^[67] In silicon-based devices, typical doping levels range from $10^{14} to $10^{20} cm^{-3}, spanning lightly doped substrates to heavily doped contacts.^[68]

P-N Junctions

A p-n junction forms at the interface between a p-type semiconductor, doped with acceptors to create an abundance of holes, and an n-type semiconductor, doped with donors to provide excess electrons. Upon joining these regions, free electrons from the n-side diffuse across the junction and recombine with holes on the p-side, while holes diffuse in the opposite direction and recombine with electrons.^[69] This carrier diffusion leaves behind immobile ionized donors (positive charge) on the n-side and ionized acceptors (negative charge) on the p-side, establishing a space charge region depleted of free carriers, known as the depletion region.^[70] The charge separation generates an internal electric field that opposes further diffusion, reaching equilibrium when the diffusion current balances the drift current induced by the field.^[71] In equilibrium, the Fermi levels across the junction align, resulting in no net current flow. The built-in potential V_{bi}, which quantifies the electrostatic potential difference across the depletion region, is given by

V_{bi} = \frac{kT}{q} \ln \left( \frac{N_a N_d}{n_i^2} \right),

where k is Boltzmann's constant, T is temperature, q is the elementary charge, N_a and N_d are the acceptor and donor concentrations, respectively, and n_i is the intrinsic carrier concentration.^[70] This potential barrier, typically 0.5–1 V for silicon junctions, maintains charge neutrality and prevents sustained carrier flow without external bias.^[69] The width of the depletion region W depends on the built-in potential and doping levels, approximated under the depletion approximation for an abrupt junction as

W = \sqrt{ \frac{2 \epsilon (V_{bi} - V)}{q} \left( \frac{1}{N_a} + \frac{1}{N_d} \right) },

where \epsilon is the permittivity of the semiconductor and V is any applied voltage (zero at equilibrium).^[72] For asymmetrically doped junctions, W is dominated by the lightly doped side, scaling inversely with the square root of doping density.^[70] The p-n junction exhibits a voltage-dependent capacitance due to the varying depletion width, analogous to a parallel-plate capacitor with the depletion region as the dielectric. The junction capacitance per unit area is C = \epsilon / W, which decreases with increasing reverse bias as W widens, enabling varactor diode applications for tuning circuits.^[70] P-n junctions are classified as abrupt or graded based on the doping profile transition. In abrupt junctions, doping changes sharply at the interface, leading to a rectangular charge distribution and the depletion width formula above. Graded junctions feature a gradual doping variation, often linear, resulting in a smoother electric field and broader depletion regions suitable for high-voltage devices.^[73] As an alternative to p-n junctions, metal-semiconductor contacts form Schottky barriers, where the work function difference between metal and semiconductor creates a depletion region without requiring doping on both sides. These offer faster switching due to majority carrier transport but lower barrier heights compared to p-n junctions.^[74]

Doping Techniques

Doping techniques introduce controlled impurities, known as dopants, into a semiconductor lattice to modify its electrical properties, enabling the creation of n-type or p-type materials with precise carrier concentrations. These methods must achieve uniform distribution, minimize lattice damage, and ensure dopant activation for effective ionization at operational temperatures. Common approaches include diffusion, ion implantation, and in-situ doping during epitaxial growth, each suited to different scales and precision requirements in device fabrication.^[75] Diffusion doping involves exposing the semiconductor to a dopant source at elevated temperatures, typically 800–1200°C, where impurity atoms migrate into the lattice driven by a concentration gradient. This process follows Fick's first law, expressed as J = -D \nabla N, where J is the diffusion flux, D is the diffusion coefficient, and \nabla N is the concentration gradient; higher temperatures increase D, allowing deeper penetration but risking unwanted redistribution. It is widely used for uniform bulk doping in silicon, though it lacks sharp boundaries compared to other methods.^[76] Ion implantation accelerates dopant ions, such as boron or phosphorus, to energies of 10–500 keV, embedding them directly into the semiconductor lattice at depths of tens to hundreds of nanometers, with doses precisely controlled from $10^{11} to $10^{16} cm^{-2}. The implantation creates lattice damage, necessitating a subsequent annealing step at 800–1100°C to repair the crystal structure and electrically activate the dopants by placing them on substitutional sites. This technique offers excellent control for shallow profiles but requires careful dose management to avoid amorphization.^[77]^[78] Epitaxial growth doping incorporates impurities in-situ during crystal deposition via techniques like chemical vapor deposition (CVD) or molecular beam epitaxy (MBE), where dopant precursors are introduced into the growth chamber alongside the host material. This yields highly uniform dopant profiles throughout the layer thickness, ideal for heterostructures and thin films, as the atoms integrate during formation without post-process diffusion. For example, in MBE, dopant flux is calibrated to achieve concentrations up to $10^{19} cm^{-3} while maintaining epitaxial quality.^[79] Shallow donors and acceptors, such as phosphorus in silicon, have low activation energies—approximately 0.045 eV for phosphorus donors—allowing nearly complete ionization at room temperature and efficient contribution to conductivity without thermal excitation. This contrasts with deep-level impurities, which require higher energies and remain partially inactive.^[80] Selective doping employs masks, such as gadolinium or oxide layers, to pattern impurity introduction, shielding specific areas during diffusion or implantation for defined regions like source/drain contacts. In modern sub-5 nm nodes, ultra-shallow junctions pose challenges, including surface barriers limiting in-diffusion, crystal damage from implantation, and non-uniformity in 3D structures like fins, driving innovations in gentle, conformal methods for 2D materials.^[81]^[82]

Amorphous and Other Semiconductors

Amorphous Semiconductors

Amorphous semiconductors are non-crystalline materials characterized by the absence of long-range atomic order, resulting in a disordered atomic structure that introduces localized electronic states in the band tails extending into the energy gap.^[83] This structural disorder leads to a mobility gap—the energy range separating extended states in the conduction and valence bands—that is typically 0.5–2 eV wider than the band gap of their crystalline counterparts, due to the exponential decay of density of states near the band edges.^[84] Unlike crystalline semiconductors, where periodic lattices enable well-defined Bloch waves, the lack of periodicity in amorphous forms promotes Anderson localization, confining charge carriers to localized states and altering transport properties.^[85] A prominent example is hydrogenated amorphous silicon (a-Si:H), produced via plasma-enhanced chemical vapor deposition, where hydrogen atoms passivate dangling bonds—unsaturated silicon atoms that would otherwise create deep defect states.^[86] This passivation reduces the density of such defects and yields undoped a-Si:H with a dark conductivity of approximately $10^{-10} S/cm, making it suitable for applications like thin-film solar cells where high photosensitivity is essential.^[87] Charge transport in amorphous semiconductors often occurs via variable-range hopping, a mechanism where carriers tunnel between localized states to minimize energy barriers over distance, described by the conductivity formula \sigma = \sigma_0 \exp\left[-(T_0/T)^{1/4}\right] in three dimensions. This temperature dependence arises from Anderson localization in the disordered potential landscape, contrasting with band-like conduction in crystals and dominating at low temperatures where hopping over longer but lower-energy paths becomes favorable.^[88] Defects in amorphous semiconductors, primarily coordination defects such as threefold-coordinated silicon atoms forming dangling bonds, introduce midgap states that trap carriers and degrade performance.^[89] In high-quality a-Si:H, hydrogen passivation lowers the density of these neutral defect states to around $10^{16} cm^{-3}, significantly improving electronic properties compared to unhydrogenated forms.^[90] A key phenomenon in a-Si:H is the Staebler-Wronski effect, where prolonged exposure to light increases the defect density by breaking weak Si-Si bonds, leading to reversible degradation of conductivity and photoconductivity. This light-induced metastability can be fully reversed through thermal annealing at temperatures around 200°C, restoring the original low defect density.^[91]

Organic Semiconductors

Organic semiconductors are carbon-based materials, primarily consisting of conjugated polymers and small molecules, that exhibit semiconducting properties due to the delocalization of π-electrons across their molecular structures. These materials enable charge transport through overlapping π-orbitals, which form extended conjugated systems facilitating electron mobility. Representative examples include conjugated polymers such as polythiophene, which has an optical bandgap of approximately 2 eV, allowing absorption in the visible spectrum.^[92] Similarly, small molecules like pentacene, with a bandgap around 1.8 eV, demonstrate efficient π-orbital overlap in thin films, promoting intermolecular charge transfer essential for device performance.^[93] This molecular design contrasts with rigid inorganic counterparts by offering inherent flexibility, making organic semiconductors ideal for emerging applications in bendable electronics.^[94] In organic semiconductors, the electronic structure is characterized by the highest occupied molecular orbital (HOMO) and lowest unoccupied molecular orbital (LUMO), where the HOMO-LUMO energy gap serves as an analog to the valence-conduction band gap in inorganic semiconductors, determining the material's ability to conduct under excitation. Charge transport primarily occurs via hopping mechanisms between localized molecular sites, rather than extended band conduction, due to the disordered nature of organic films. The hopping rate is described by Marcus theory, which accounts for polaron formation and environmental coupling:

k = \frac{2\pi}{\hbar} |V|^2 \sqrt{\frac{1}{4\pi \lambda k_B T}} \exp\left[-\frac{\lambda}{4 k_B T}\right]

Here, V represents the transfer integral quantifying electronic coupling between sites, and \lambda is the reorganization energy reflecting lattice relaxation during charge transfer. This model highlights how optimizing molecular packing to maximize V while minimizing \lambda enhances mobility, as demonstrated in theoretical studies of conjugated systems.^[95]^[96] Doping in organic semiconductors is typically achieved through chemical redox processes or electrochemical methods, introducing charge carriers by oxidation or reduction of the molecular backbone. For instance, poly(3,4-ethylenedioxythiophene):polystyrene sulfonate (PEDOT:PSS) can reach conductivities up to 10^3 S/cm via secondary doping with polar solvents that phase-separate the conductive PEDOT chains, enabling metallic-like behavior.^[97] Unlike high-temperature annealing required for inorganic materials, organic semiconductors support low-temperature processing below 200°C, compatible with flexible substrates like plastics. However, inherent instability to oxygen and moisture necessitates encapsulation strategies, such as multilayer barriers, to maintain performance over extended periods.^[98]^[99] Recent advancements as of 2025 have focused on perovskite-organic hybrids, combining the high absorption of halide perovskites with the flexibility of organic semiconductors to improve stability and efficiency in optoelectronic devices. These hybrids leverage interfacial engineering to reduce recombination losses, achieving enhanced charge extraction in tandem structures.^[100]

History

Discovery and Early Research

The earliest documented observation of semiconducting behavior occurred in 1833, when Michael Faraday noted that the electrical conductivity of silver sulfide increased with rising temperature, an effect contrary to that observed in metals.^[101] This discovery highlighted the temperature-dependent resistance in certain materials, laying groundwork for understanding non-metallic conduction. In the 1870s, further empirical insights emerged through studies of crystal detectors for radio waves. Ferdinand Braun observed in 1874 that a metal point in contact with a galena (lead sulfide, PbS) crystal allowed current to flow preferentially in one direction, demonstrating rectification properties that foreshadowed diode behavior.^[102] These "cat's-whisker" setups, refined in subsequent decades, utilized galena crystals to detect weak radio signals, marking practical applications of semiconductor-like rectification before the advent of quantum theory.^[103] Theoretical foundations advanced in the early 20th century with Paul Drude's 1900 free electron model, which treated conduction electrons in metals as a classical gas to explain electrical and thermal conductivity, though it initially overlooked quantum effects.^[104] Arnold Sommerfeld refined this in 1928 by incorporating quantum mechanics and Fermi-Dirac statistics, providing a more accurate description of electron behavior in metals while highlighting limitations for non-metallic solids.^[105] The 1930s saw pivotal developments in solid-state theory. Felix Bloch's 1928 zone theory demonstrated that electrons in a periodic crystal lattice form wavefunctions as plane waves modulated by the lattice periodicity, enabling the concept of energy bands. Building on this, Alan Wilson developed band theory in 1931, classifying materials as conductors, insulators, or semiconductors based on band gaps and showing how thermal excitation could enable conduction in semiconductors with narrow gaps.^[106] Wartime exigencies in the 1940s spurred applied research on silicon detectors. Efforts to produce high-purity silicon and germanium crystals for radar microwave detectors advanced purification techniques and revealed silicon's potential for rectification under high-frequency conditions.^[107] These developments bridged theoretical insights with practical device fabrication, setting the stage for postwar semiconductor innovations.

Invention of Transistor

The invention of the transistor at Bell Laboratories marked a pivotal advancement in semiconductor technology, enabling solid-state amplification and switching. On December 16, 1947, physicists John Bardeen and Walter Brattain demonstrated the first working point-contact transistor using a slab of n-type germanium with two closely spaced gold foil contacts serving as the emitter and collector, and a third contact as the base.^[108] This device achieved current and power amplification, with early prototypes providing a power gain of approximately 20 dB, equivalent to about 100 times the input signal, by injecting charge carriers (holes) from the emitter into the base, where an electric field at the collector modulated their flow to produce an amplified output.^[109] The point-contact transistor relied on surface effects at the metal-semiconductor interfaces, making it fragile and prone to mechanical instability, but it proved the feasibility of semiconductor-based amplification as a replacement for bulky vacuum tubes.^[108] Building on this breakthrough, William Shockley, who led the semiconductor research group at Bell Labs, theoretically conceived and developed the more practical junction transistor in early 1948.^[110] Unlike the point-contact design, the junction transistor utilized a bulk semiconductor structure with two back-to-back p-n junctions—typically in an NPN or PNP configuration—formed by doping regions of the material to create emitter, base, and collector layers.^[108] This allowed for greater reliability and manufacturability, as the amplification occurred through volume conduction rather than delicate point contacts, avoiding issues like contact instability while maintaining similar operational principles.^[111] Shockley's innovation, patented in 1948, facilitated mass production and became the foundation for subsequent transistor designs.^[110] The transistor's operation centered on controlling the collector-emitter current via a small base current, yielding a current gain \beta = I_C / I_B, where I_C is the collector current and I_B is the base current, enabling efficient signal amplification.^[108] Initially fabricated from germanium for its suitable electrical properties, these early transistors were limited by the material's sensitivity to temperature and humidity.^[112] By 1954, Bell Labs researcher Morris Tanenbaum produced the first silicon junction transistor, which offered superior thermal stability—operating reliably at temperatures up to 150°C compared to germanium's 75°C limit—and reduced environmental degradation, prompting a rapid industry shift to silicon.^[112] Shockley formalized the underlying theory in his influential 1950 book, Electrons and Holes in Semiconductors, which detailed carrier transport and junction behavior essential to transistor function.^[113] The trio's contributions earned them the 1956 Nobel Prize in Physics for their semiconductor research and the discovery of the transistor effect.^[114] By the late 1950s, transistors had begun replacing vacuum tubes in electronic systems due to their compact size, low power consumption, and reliability, revolutionizing computing and communications.^[115]

Modern Developments

The invention of the integrated circuit in 1958 by Jack Kilby at Texas Instruments marked a pivotal advancement in semiconductor technology, allowing multiple transistors and components to be fabricated on a single silicon chip. Independently, Robert Noyce at Fairchild Semiconductor developed a complementary planar process in 1959, enabling scalable production. These innovations laid the foundation for Moore's Law, articulated by Gordon Moore in 1965, which observed that the number of transistors on an integrated circuit would double approximately every year, later revised to every two years in 1975, driving exponential improvements in performance and cost reduction.^[116]^[117]^[118] From the 1960s through the 1980s, complementary metal-oxide-semiconductor (CMOS) technology emerged as the dominant paradigm for silicon-based integrated circuits, offering low power consumption and high noise immunity. Silicon CMOS scaled progressively from micron-level features to sub-micron dimensions by the late 1980s, facilitated by advances in photolithography and doping processes, which enabled the production of increasingly complex chips for computing and consumer electronics.^[119]^[120] In the 1990s and 2010s, continued scaling faced physical limits with planar transistors, leading to the adoption of fin field-effect transistors (FinFETs) in the 2000s. Invented by Chenming Hu at the University of California, Berkeley, FinFETs feature a three-dimensional fin-shaped channel that improves gate control and reduces leakage, first commercialized by Intel at the 22 nm node in 2011. Concurrently, extreme ultraviolet (EUV) lithography, developed through collaborative efforts in the 2000s, became essential for patterning features below 7 nm, enabling high-resolution fabrication with 13.5 nm wavelengths and supporting the transition to sub-5 nm nodes.^[121]^[122]^[123] Entering the 2020s, leading foundries like TSMC and Samsung initiated production of 2 nm process nodes in 2025, incorporating gate-all-around (GAA) transistors and backside power delivery to sustain scaling beyond FinFET limits while enhancing performance and efficiency. To address silicon's fundamental constraints, research has advanced beyond-silicon materials, including two-dimensional (2D) transition metal dichalcogenides like molybdenum disulfide (MoS₂) for ultra-thin channels with superior electrostatic control, and semiconductor quantum dots for tunable optoelectronic properties in next-generation devices. Wide-bandgap semiconductors such as silicon carbide (SiC) and gallium nitride (GaN) have shifted toward high-power applications, particularly in electric vehicle inverters and chargers, where their ability to handle higher voltages and temperatures reduces energy losses compared to silicon.^[124]^[125]^[126] AI-driven tools have revolutionized semiconductor design in the 2020s, with machine learning integrated into electronic design automation (EDA) workflows to optimize layouts, predict yields, and accelerate verification for complex chips. Sustainability efforts have gained prominence, focusing on recycling semiconductor materials like silicon wafers and rare earths to minimize environmental impact, supported by industry initiatives and government programs aimed at circular supply chains.^[127]

Applications

Electronic Devices

Semiconductor electronic devices leverage transistor action to enable amplification and switching, forming the backbone of modern electronics from simple amplifiers to complex computing systems. These devices exploit the controlled flow of charge carriers in doped semiconductor materials, primarily silicon, to process electrical signals with high efficiency and precision. Bipolar junction transistors (BJTs) and field-effect transistors (FETs), especially metal-oxide-semiconductor FETs (MOSFETs), dominate discrete applications, while their integration into circuits scales functionality exponentially. The bipolar junction transistor (BJT) consists of three doped regions forming two p-n junctions, available in NPN and PNP configurations where the emitter, base, and collector layers alternate in doping type. In an NPN BJT, a small base current modulates a larger collector current, yielding a common-emitter current gain β defined as β = I_C / I_B, with typical values exceeding 100 for standard silicon devices, which facilitates high-fidelity analog amplification in audio and radio frequency circuits. PNP variants operate similarly but with reversed polarity, offering complementary functionality in push-pull amplifier stages. BJTs excel in applications requiring linear signal handling due to their high transconductance, though they consume more power than FET counterparts owing to base current requirements. The field-effect transistor (FET), particularly the MOSFET, controls channel conductivity through an electric field induced by gate voltage, isolating the gate from the channel to minimize control power. In an n-channel enhancement-mode MOSFET, a positive gate-to-source voltage V_{GS} above the threshold V_{th} forms an inversion layer between source and drain, allowing drain current I_D to flow under applied drain-to-source voltage V_{DS}. In the linear (triode) region, where V_{DS} is small, the drain current follows

I_D = \mu C_{ox} \frac{W}{L} \left[ (V_{GS} - V_{th}) V_{DS} - \frac{V_{DS}^2}{2} \right],

with μ as carrier mobility, C_{ox} as gate oxide capacitance per unit area, and W/L as channel aspect ratio; this quadratic relation underscores MOSFETs' role in voltage-controlled resistance for switching and amplification. MOSFETs are preferred for digital logic due to their near-zero gate current and scalability, powering everything from low-voltage sensors to high-speed drivers. Integrated circuits (ICs) combine millions to billions of transistors on a single chip, enabling compact, low-cost implementations of complex functions like logic processing. A canonical example is the CMOS inverter, which pairs an n-channel MOSFET (pull-down) with a p-channel MOSFET (pull-up) to invert input logic levels while drawing negligible static power, as one transistor is always off. These gates form the basis of combinational and sequential logic in microprocessors, where modern designs incorporate over 100 billion transistors by 2025 through 3D stacking techniques that vertically integrate multiple layers to boost density and interconnect speed without excessive lateral scaling. Power MOSFETs extend this to high-voltage switching, with silicon carbide variants rated up to 3.3 kV for efficient conversion in electric vehicles and renewable energy systems. Device performance is inherently limited by noise and frequency constraints. Johnson-Nyquist noise, arising from thermal agitation of charge carriers, generates equivalent voltage fluctuations across resistive elements like channel resistances, setting a fundamental floor for signal-to-noise ratios in amplifiers. Speed is capped by the transition frequency f_T, the point where current gain unity, approximated as f_T = g_m / (2π C_{gs}) for FETs, with g_m as transconductance and C_{gs} as gate-source capacitance; values exceed 100 GHz in advanced nodes, dictating RF capabilities.

Optoelectronics

Optoelectronics encompasses semiconductor devices that exploit the interaction between electrical currents and light, enabling the conversion of electrical signals to optical ones and vice versa. These devices leverage the bandgap properties of semiconductors to generate, detect, or manipulate photons, forming the basis for technologies in displays, communications, and energy harvesting. Key mechanisms include radiative recombination in forward-biased junctions for emission and photoexcitation in reverse-biased structures for detection. Light-emitting diodes (LEDs) operate on the principle of electroluminescence, where forward bias injects electrons and holes into the active region, leading to radiative recombination that emits photons. The internal quantum efficiency (IQE) of an LED is defined as η = (number of recombined photons) / (number of injected electrons), quantifying the fraction of carrier recombination that produces light rather than non-radiative losses.^[128] Advances in gallium nitride (GaN)-based LEDs have enabled efficient blue light emission, crucial for white LEDs used in lighting and displays; this breakthrough earned the 2014 Nobel Prize in Physics for Isamu Akasaki, Hiroshi Amano, and Shuji Nakamura. GaN LEDs achieve high IQE through improved crystal quality and p-type doping, allowing phosphor-converted white light with wall-plug efficiencies exceeding 70% in commercial devices.^[129] Photodiodes function as light detectors by absorbing photons to generate electron-hole pairs, which under reverse bias produce a measurable photocurrent while minimizing dark current. The responsivity R, a key performance metric, is given by R = I_ph / P_opt = η e / (h c / λ), where I_ph is the photocurrent, P_opt is the incident optical power, η is the quantum efficiency, e is the electron charge, h is Planck's constant, c is the speed of light, and λ is the wavelength.^[130] PIN photodiodes, featuring an intrinsic region between p- and n-layers, enhance speed and sensitivity by widening the depletion region for better carrier collection and reduced capacitance.^[131] These structures are widely used in applications requiring high bandwidth, such as optical communication receivers, with responsivities up to 0.9 A/W in silicon for near-infrared wavelengths.^[132] Semiconductor laser diodes produce coherent light through stimulated emission, achieved by providing optical feedback via Fabry-Pérot cavities formed by cleaved facets or distributed Bragg reflectors. Above the threshold current I_th, population inversion sustains lasing, with I_th ∝ 1 / (cavity length) due to the inverse relationship between mirror loss and cavity length in the threshold gain condition.^[133] These devices, often based on materials like GaAs or InP, emit at precise wavelengths for applications in data transmission, offering output powers of several milliwatts and modulation speeds up to 100 Gbps. Solar cells convert sunlight into electricity via the photovoltaic effect, where photons absorbed in a p-n junction generate carriers separated by the built-in field. The Shockley-Queisser limit establishes a theoretical maximum efficiency of ~33% for single-junction cells under AM1.5 illumination, arising from bandgap mismatches with the solar spectrum and thermalization losses.^[134] Multi-junction cells using GaAs and related III-V materials stack junctions with different bandgaps to capture a broader spectrum, achieving record efficiencies of ~47% under concentrated light as of 2025. These high-efficiency devices, exemplified by inverted metamorphic structures, power space missions and concentrator systems.^[134] Organic light-emitting diodes (OLEDs) extend optoelectronic principles to organic semiconductors, where conjugated polymers or small molecules serve as the emissive layer, enabling flexible and large-area displays with efficiencies rivaling inorganic LEDs.^[135] In fiber optic transceivers, semiconductor LEDs, photodiodes, and lasers integrate to modulate and demodulate signals over optical fibers, supporting data rates beyond 400 Gbps in telecommunications networks.^[136]

Power Electronics

Power electronics leverages semiconductor devices to efficiently convert and control electrical power in high-voltage, high-current applications such as electric vehicles (EVs), renewable energy grids, and industrial motor drives. These devices operate at power levels ranging from kilowatts to megawatts, emphasizing low conduction losses, fast switching, and robustness under thermal stress. Silicon-based devices have dominated traditionally, but wide-bandgap materials like silicon carbide (SiC) and gallium nitride (GaN) are increasingly adopted for their superior efficiency and higher operating voltages. Power diodes are essential for rectification and freewheeling in power converters, with fast-recovery types designed to minimize switching losses by achieving low reverse recovery time (t_{rr}) below 100 ns. These diodes reduce the stored charge during reverse bias, enabling higher switching frequencies without excessive energy dissipation. For instance, ultrafast recovery diodes exhibit t_{rr} in the 10-50 ns range, supporting applications in switched-mode power supplies and inverters where rapid commutation is critical. Insulated-gate bipolar transistors (IGBTs) integrate the high-input impedance and easy gate drive of a metal-oxide-semiconductor field-effect transistor (MOSFET) with the low on-state voltage drop of a bipolar junction transistor (BJT), making them ideal for high-power switching. The collector-emitter saturation voltage (V_{CE(sat)}) is typically around 2 V, which limits conduction losses in megawatt-scale systems like HVDC converters and large motor drives. IGBTs handle currents up to thousands of amperes and voltages exceeding 1.7 kV, enabling efficient power flow in renewable energy integration and EV traction systems.^[137] Wide-bandgap semiconductors enhance power electronics performance through higher breakdown fields and thermal conductivity. SiC Schottky diodes achieve breakdown voltages greater than 1.7 kV with near-zero reverse recovery charge, eliminating tail current issues in silicon p-n diodes and supporting high-frequency operation in EV chargers. Similarly, GaN high-electron-mobility transistors (HEMTs) enable switching above 600 V at megahertz frequencies, reducing system size and improving efficiency in DC-DC converters for renewable sources. These devices offer specific on-resistances orders of magnitude lower than silicon equivalents at comparable voltages.^[138]^[139] Effective thermal management is crucial, as power devices are limited to junction temperatures below 200°C to ensure reliability and prevent degradation. Heat dissipation strategies, including advanced packaging and cooling, maintain safe operating conditions during high-power cycles. Baliga's figure of merit (FOM) quantifies material suitability for power handling, defined as \epsilon \mu E_c^3, where \epsilon is the permittivity, \mu is the electron mobility, and E_c is the critical electric field; wide-bandgap materials like SiC and GaN yield FOM values 10-100 times higher than silicon, enabling compact, high-efficiency designs. In 2025, the SiC and GaN power semiconductor market is projected to reach approximately $8.8 billion, driven primarily by renewables such as solar inverters and wind turbines, where these devices reduce switching and conduction losses by up to 50% compared to silicon counterparts. This efficiency gain supports grid-scale energy storage and EV adoption, lowering overall system costs and carbon emissions.^[140]^[141]

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[PDF] Lecture 1 - The Compound Semiconductor Palette
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[PDF] WIDE-BANDGAP SEMICONDUCTORS - NSF PAR
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[PDF] Wide Bandgap Semiconductors: Pursuing the Promise
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Bonding in Metals and Semiconductors
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[PDF] Electrons and Holes in Semiconductors
Figure 1–25 summarizes the temperature dependence of majority carrier concentrations. ... (a) The temperature at which the intrinsic concentration ni ...
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[PDF] 3.024 Electrical, Optical, and Magnetic Properties of Materials
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Feb 5, 2014 · coefficient of the band gap (dEg/dT ) between −3.5 × 10. −4 and −6.0 × 10. −4. eV/K for Mg2Si [6,13,28]. A value of. −4.0 × 10−4. eV/K was ...
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