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Auger electron spectroscopy

Auger electron spectroscopy (AES) is a surface-sensitive analytical technique that determines the elemental composition of the outermost atomic layers (typically 1–10 nm) of solid materials by measuring the kinetic energies of Auger electrons emitted following excitation by a focused primary electron beam.^[1] The method provides semi-quantitative information on all elements except hydrogen and helium, with detection limits around 0.1–0.5 atomic percent.^[2] It is widely applied in materials science for characterizing thin films, interfaces, corrosion processes, and surface contaminants.^[3] The underlying principle, known as the Auger effect (sometimes referred to as the Auger–Meitner effect to acknowledge her contribution), involves the ionization of an inner-shell (core-level) electron by the incident beam (typically 2–10 keV), creating a core hole that is subsequently filled by an electron from a higher-energy shell, with the released energy ejecting a secondary Auger electron whose kinetic energy is uniquely characteristic of the atom's electronic structure.^[4] This non-radiative relaxation process was described by Lise Meitner in 1922 and independently observed by Pierre Auger in 1923 using cloud-chamber experiments detecting secondary electrons.^[1] The surface specificity arises from the short inelastic mean free path of the emitted electrons (around 1–3 nm), ensuring analysis is confined to the near-surface region.^[3] In practice, AES is performed in ultrahigh vacuum (typically <10^{-9} torr) to minimize surface contamination, often combined with ion-beam sputtering for depth profiling or scanning capabilities for nanoscale imaging via scanning Auger microscopy (SAM).^[2] Key advantages include high spatial resolution (spot sizes down to 25 nm), rapid acquisition of survey spectra (<5 minutes), and sensitivity to chemical shifts for speciation, though challenges involve charging effects on insulators and the need for standards for accurate quantification.^[3] Since its practical development for solids in the 1950s, AES has become a cornerstone for surface analysis in fields like semiconductors, catalysis, and nanotechnology.^[3]

Fundamentals

The Auger Effect

The Auger effect is a non-radiative relaxation process in which an atom, following the ionization of a core-level electron (creating a core hole), undergoes a transition where an electron from a higher-energy shell fills the vacancy, and the released energy ejects another electron from an outer shell, known as the Auger electron.^[3] This process leaves the atom in a doubly ionized state, with the Auger electron carrying a kinetic energy characteristic of the atomic species involved.^[1] The Auger effect involves a three-electron sequence: an initial core hole is created (for example, in the K-shell by incident radiation or particles), followed by an electron from a valence shell cascading into the core hole, which transfers energy to eject a third electron typically from a valence shell.^[3] This cascade highlights the atomic shell notation, such as KLL for processes involving the K-shell hole and two L-shell electrons, emphasizing the localized nature of the relaxation within the atom's electronic structure.^[5] The kinetic energy of the Auger electron equals the binding energy of the initial core level minus the binding energies of the two outer levels involved, minus the work function of the material.^[1] Conceptually, this can be visualized in a schematic diagram of atomic energy levels: an arrow indicates core ionization creating a deep hole, followed by a downward transition from a higher shell filling the hole, with the excess energy shown as an outgoing arrow ejecting the Auger electron from an outer shell, resulting in two shallower holes.^[6] The effect is named after French physicist Pierre Auger. In contrast to radiative decay, where the core hole relaxation emits an X-ray photon with energy equal to the binding energy difference, the Auger effect competes as a non-radiative alternative and dominates for light elements (atomic number Z < 10) due to the higher probability of electron-electron interactions over photon emission in low-Z atoms, where fluorescence yields are low (often below 0.1).^[7] For heavier elements, radiative X-ray emission becomes more prevalent as fluorescence yields increase with Z.^[8]

Auger Electron Emission

In Auger electron spectroscopy, Auger electrons are generated through electron beam excitation, where a primary electron beam with energies typically ranging from 1 to 10 keV bombards the sample surface. These primary electrons ionize core levels of atoms, such as K or L shells, by ejecting an inner-shell electron and creating a core hole; common transitions include KLL and LMM processes. This initial ionization event, requiring energies above the core-level binding threshold (often 100 eV to several keV depending on the shell), initiates the cascade leading to Auger emission.^[9] The emitted Auger electrons possess kinetic energies that are highly characteristic of the emitting atom and the specific transition involved, spanning a range of 30 eV to 3 keV. Once the primary beam energy surpasses the ionization threshold for the core level, the kinetic energy of the Auger electron becomes independent of the incident beam energy, enabling reliable elemental identification from fixed peak positions in spectra. Transitions follow standard atomic notation, such as KLL to denote a K-shell hole filled by an L-shell electron, with ejection of another L-shell electron, and are governed by selection rules that restrict allowed processes, including angular momentum conservation (e.g., Δl = ±1 for the transitioning electron).^[3] The kinetic energy E_K of the Auger electron is determined by the energy balance in the relaxation process and given by

E_K = E_1 - E_2 - E_3 - \phi

where E_1 is the binding energy of the initial core level, E_2 the binding energy of the level to which the electron relaxes, E_3 the binding energy of the level from which the Auger electron is ejected, and \phi the work function of the material, which accounts for the energy needed for the electron to escape the surface potential. This relation highlights the atomic specificity of the process, as the energies E_1, E_2, and E_3 are unique to each element and transition.^[6] Auger electrons originate from near the surface due to their susceptibility to inelastic scattering, with a mean free path of approximately 1 nm in typical solids; this limits detection to electrons generated within the top 1-10 nm, conferring exceptional surface sensitivity to the technique. The escape depth is further characterized by the mean escape depth (MED), which represents the average depth from which electrons emerge without significant energy loss and varies with factors like emission angle and material inelastic scattering properties—for instance, MED values for common Auger transitions (e.g., Si L₂₃VV at ~60 eV) are on the order of 0.5-2 nm at normal emission.^[10] In measured spectra, Auger peaks appear as sharp, element-specific features at their characteristic kinetic energies, contrasting with the broad continuum of low-energy secondary electrons (typically <50 eV) arising from multiple inelastic collisions of primary and backscattered electrons, as well as discrete plasmon peaks from collective surface or bulk excitations. The secondary electron background dominates the low-energy region, but derivative-mode acquisition enhances the visibility of Auger peaks by differentiating the signal to suppress the monotonic background while amplifying the fine structure of the transitions.^[3]

History and Development

Discovery of the Auger Effect

The Auger effect was first described theoretically by Austrian physicist Lise Meitner in 1922 in the context of beta-ray spectroscopy from radioactive decay, where she explained non-radiative transitions leading to the emission of characteristic secondary electrons as an alternative to X-ray fluorescence. Independently, French physicist Pierre Auger observed the effect experimentally in 1923 using a cloud chamber filled with nitrogen gas exposed to X-rays, detecting tracks of secondary electrons with discrete kinetic energies corresponding to K-shell ionization of nitrogen atoms. These were identified as resulting from the photoelectric effect, marking the initial evidence of the Auger process in gases, though its full atomic significance was not immediately appreciated.^[11] In the following years, the effect was confirmed through experiments on both gases and solids using X-ray excitation. Early spectroscopic investigations, such as those by Robinson and Cassie in 1926, resolved Auger electron energies using magnetic spectrometers. G. Wentzel provided key theoretical insights in 1927 on transition probabilities and energy distributions, establishing the process as an autoionization mechanism.^[12] These studies extended the understanding of Auger emission to condensed matter. The effect's naming has been subject to debate, with calls to recognize it as the Auger–Meitner effect to acknowledge Meitner's prior theoretical contribution, as discussed in recent literature.^[13] A key milestone for solids was in 1953, when J.J. Lander identified discrete Auger peaks in the energy spectra of secondary electrons from various materials excited by electron bombardment, demonstrating their potential as elemental fingerprints. G.A. Harrower further advanced this in 1956 by recording detailed Auger spectra from molybdenum and tungsten surfaces using a retarding field analyzer.^[14]^[15]

Evolution of AES Instrumentation

The evolution of Auger electron spectroscopy (AES) instrumentation in the 1960s marked a transition from rudimentary prototypes to practical, commercially viable systems. Early efforts focused on improving electron energy analyzers to detect the low-intensity Auger signals efficiently. A pivotal advancement was the development of the cylindrical mirror analyzer (CMA) in 1969 by Palmberg and colleagues at Varian Associates, which offered high transmission efficiency and enabled rapid acquisition of spectra with good signal-to-noise ratios. This innovation facilitated the commercialization of the first dedicated AES instruments around the same time, making the technique accessible beyond specialized research labs.^[3] The 1970s saw further refinements in analyzer design and spatial capabilities, enhancing resolution and applicability. Hemispherical sector analyzers (HSAs), building on designs from electron spectroscopy, were introduced for AES to achieve superior energy resolution, allowing better differentiation of overlapping peaks in complex spectra. Concurrently, the integration of AES with scanning electron microscopy (SEM) gave rise to scanning AES (SAM), first demonstrated in 1971 by MacDonald and Waldrop using a CMA mounted in an SEM, with early commercial implementations by companies like Associated Electrical Industries (AEI) that combined elemental mapping with high spatial resolution down to micrometers. These developments expanded AES from static surface analysis to imaging applications.^[3]^[16] In the 1980s and 1990s, instrumentation advanced to address practical challenges like contamination and sample charging. Ultra-high vacuum (UHV) systems evolved to routinely achieve base pressures below 10^{-10} Torr using ion pumps and bakeable chambers, significantly reducing background signals from residual gases and enabling cleaner surface studies.^[17] Pulsed electron beam techniques emerged around 1982 to analyze insulating materials without excessive charging, by intermittently exciting the sample to allow charge neutralization between pulses.^[18] The 1981 Nobel Prize in Physics awarded to Kai Siegbahn for electron spectroscopy for chemical analysis (ESCA, now XPS) underscored the broader impact of high-resolution surface techniques, inspiring parallel improvements in AES vacuum and detection systems. Entering the 2000s, AES systems became more integrated and user-friendly through multi-technique platforms combining AES with XPS, allowing complementary chemical state and depth profiling in a single UHV environment. Software innovations, such as automated peak identification algorithms in tools like ESCApe, streamlined spectrum interpretation by matching peaks to elemental databases and quantifying compositions with minimal user intervention. In the 2010s, synchrotron-based AES emerged for angle-resolved studies, leveraging tunable X-ray sources to probe deeper into angular dependencies and electronic structure with enhanced sensitivity.^[19]^[20]^[21] In the 2020s, further advances have included the development of new databases for Auger electron and X-ray spectra to improve accuracy in peak identification (as of 2020), and theoretical refinements unlocking greater potential in AES for probing subtle material properties, such as oxidation states via K-shell transitions (as of 2024). These enhancements continue to expand AES applications in nanotechnology and materials characterization.^[22]^[23]^[24]

Instrumentation

Primary Electron Sources and Optics

In Auger electron spectroscopy (AES), the primary electron beam is generated using specialized electron sources that provide stable, high-brightness emission to excite core-level electrons in the sample. Thermionic sources, typically employing a heated tungsten filament, operate by boiling electrons off the cathode surface at temperatures around 2000–2500 K, yielding current densities of approximately 100 A/cm².^[25] These sources are robust and cost-effective but limited in brightness compared to advanced alternatives. Lanthanum hexaboride (LaB₆) cathodes, introduced in the 1970s and widely adopted in modern instruments by the 1990s for their enhanced stability and longevity, offer higher current densities and reduced chromatic aberration, enabling reliable operation over extended periods without frequent filament replacement.^[26]^[25] For applications requiring superior spatial resolution, such as scanning Auger microscopy (SAM), field emission guns (FEGs) are preferred due to their exceptional brightness and nanoscale spot sizes. Schottky emitters, which combine thermal assistance with field emission from a zirconium oxide-coated tungsten tip heated to about 1800 K, and cold cathode field emitters, operating at room temperature via pure field extraction, achieve probe diameters as small as 8–10 nm.^[25]^[27] These sources deliver current densities exceeding 10³ A/cm², far surpassing thermionic options, and support beam energies ranging from 100 eV to 25 keV, with typical values of 3–5 keV optimized for core ionization in light elements.^[25]^[28] Electron optics systems focus and direct the primary beam onto the sample with minimal divergence to maintain high spatial resolution, often below 50 nm in SAM mode. Electrostatic lenses, utilizing charged electrodes to manipulate electron trajectories via electric fields, are standard for beam deflection, focusing, and astigmatism correction in dedicated AES instruments.^[25] In systems integrated with scanning electron microscopes (SEM), magnetic lenses may supplement electrostatic ones to achieve finer control over beam convergence.^[25] Alignment geometries, either coaxial—where the electron gun and energy analyzer share the same axis for maximal collection efficiency—or non-coaxial, influence signal optimization; coaxial designs minimize shadowing and enhance sensitivity across emission angles.^[29]^[30]

Energy Analyzers and Detectors

In Auger electron spectroscopy (AES), energy analyzers are essential for selecting and measuring the kinetic energies of emitted Auger electrons, typically in the range of 20–3000 eV, to produce characteristic spectra. The two primary types of analyzers used are the cylindrical mirror analyzer (CMA) and the hemispherical analyzer (HA). The CMA is favored for its high sensitivity due to its large collection efficiency, making it suitable for routine surface analysis where signal-to-noise ratio is critical.^[31] In contrast, the HA provides superior energy resolution, often achieving approximately 0.1% of the electron kinetic energy, which is advantageous for resolving fine spectral features in complex samples./01%3A_Elemental_Analysis/1.14%3A_Auger_Electron_Spectroscopy) The operating principle of the CMA involves two concentric cylindrical electrodes: the inner cylinder is typically grounded, while the outer cylinder is biased with a voltage proportional to the desired pass energy. Emitted electrons from the sample enter the annular space between the cylinders at a fixed angle and are deflected by the radial electric field toward an exit slit, where only those with the selected kinetic energy are focused and transmitted. This configuration acts as a bandpass filter, with the CMA's acceptance angle of approximately 42° enabling efficient collection of electrons emitted over a wide solid angle, enhancing overall sensitivity.^[32]^[33] The HA, on the other hand, employs two concentric hemispherical electrodes with a potential difference that creates a radial electric field, deflecting electrons entering through a narrow slit; only those matching the pass energy traverse the sector and exit to the detector, providing high energy selectivity./01%3A_Elemental_Analysis/1.14%3A_Auger_Electron_Spectroscopy) HAs are particularly employed in angle-resolved AES, where the analyzer's entrance optics allow precise control over the collection angle to probe directional emission patterns from the surface.^[3] Detectors paired with these analyzers convert the electron signals into measurable outputs, either as pulse counts for low-intensity signals or as analog currents for higher fluxes. Channel electron multipliers (CEMs) are commonly used for single-particle detection in pulse-counting mode, where incoming electrons trigger a cascade amplification within a continuous dynode structure, yielding high gain (up to 10^8) with low noise for AES spectra acquisition.^[34] Microchannel plates (MCPs), consisting of arrays of millions of tiny channel multipliers, enable parallel detection over a larger area, improving count rates and spatial resolution in imaging AES setups.^[25] For absolute current measurements, Faraday cups collect electrons directly, producing a measurable charge without amplification, though they are less sensitive and typically used for calibration or high-current verification.^[35] Energy scale calibration of analyzers relies on standard samples with well-known Auger transitions, such as gold (Au), where the MNN peak at 2024 eV serves as a reference for aligning the pass energy and verifying resolution. Recent developments in the 2020s have introduced time-of-flight (ToF) analyzers for AES, particularly in pulsed excitation schemes or coincidence experiments, offering broadband energy detection without scanning and reduced background for specialized applications like positron-annihilation-induced AES.^[36]

Experimental Procedures

Sample Preparation and Vacuum Requirements

Auger electron spectroscopy (AES) requires ultra-high vacuum (UHV) conditions, typically in the range of 10^{-9} to 10^{-12} Torr, to minimize surface adsorption of residual gases that could contaminate the sample and obscure the Auger signal from the underlying material.^[1] These low pressures are achieved and maintained using ion pumps, which sputter ions onto a getter surface to trap gases, and cryopumps, which condense gases onto cryogenically cooled surfaces for effective removal of volatile species.^[3] High vacuum alone is insufficient, as it allows uninterrupted electron beam passage but does not prevent rapid surface contamination; UHV is essential for preserving surface integrity during analysis.^[3] Sample handling in AES emphasizes avoiding exposure to atmospheric gases, which can lead to oxide or adsorbate layers as thick as several monolayers, thereby altering the surface composition detected by the technique's inherent sensitivity to the top 1-3 atomic layers.^[1] Vacuum transfer systems enable samples to be introduced from air or inert atmospheres directly into the UHV chamber, while in-situ methods such as fracturing or heating are employed to expose clean, uncontaminated surfaces immediately before analysis.^[37] For instance, tensile fracturing devices allow controlled breaking of specimens within the vacuum to reveal pristine interfaces, and resistive heating up to 800°C can desorb contaminants without introducing new ones.^[38] Even in UHV, a clean surface can accumulate less than 1 monolayer of contamination within 1-10 minutes, depending on residual gas pressure, necessitating rapid analysis protocols.^[39] Preparation techniques focus on achieving atomically clean surfaces compatible with UHV. Ion sputtering with argon ions is commonly used to remove surface oxides or contaminants, though it can induce preferential sputtering, where elements with higher sputter yields are depleted relative to the matrix, potentially leading to enrichment of elements like oxygen and distorting compositional data.^[3] For insulating samples, thermal annealing in UHV helps reduce charging effects and recrystallize surfaces, while avoiding excessive temperatures that might cause segregation.^[40] Non-conductive materials pose additional challenges due to electron beam-induced charging, which broadens spectral peaks; this is mitigated by low-energy electron flood guns that supply neutralizing electrons or argon ion neutralization systems that balance surface potential without significant damage.^[41] For volatile or thermally unstable materials, cryogenic sample stages cooled to -100°C or lower prevent evaporation or decomposition during transfer and analysis, enabling study of sensitive organics and adsorbates.^[39] These stages, often integrated with multi-axis manipulators, maintain sample stability in UHV while allowing precise positioning.^[42]

Data Acquisition Modes

In Auger electron spectroscopy (AES), data acquisition modes refer to the strategies employed to collect electron signals from the sample surface, enabling the generation of spectra or spatial maps. The primary modes include direct and derivative recordings of the electron energy distribution. In direct mode, the spectrum is recorded as the number of electrons N(E) as a function of kinetic energy E, which facilitates quantification through straightforward peak area measurements despite the challenges posed by overlapping secondary electron backgrounds.^[3] Conversely, the derivative mode plots dN(E)/dE, modulating the signal to enhance the visibility of sharp Auger peaks while suppressing the sloping background from secondary and backscattered electrons; this approach, originally achieved via analog modulation and now often through digital differentiation, is preferred for qualitative identification of elements.^[3]^[25] A fixed-energy mode is utilized for targeted mapping applications, where the analyzer is set to monitor electrons within pre-selected energy windows corresponding to specific Auger transitions, allowing faster acquisition rates compared to full spectral sweeps.^[3] Scanning types extend these modes to spatial analysis in scanning Auger microscopy (SAM). Point analysis acquires a spectrum at a single location for localized composition determination, while line scans measure elemental intensities along a linear path by stepping the beam point-by-point.^[43] Two-dimensional imaging raster-scans the focused electron beam across a surface area, collecting Auger signals to produce elemental distribution maps with resolutions below 10 nm.^[3] Dwell times per pixel typically range from 10 to 100 ms to balance signal intensity and spatial fidelity, though total acquisition for high-quality images may extend to minutes or hours depending on the field of view and beam current.^[44] Key parameters in data acquisition include beam rastering, where the primary electron beam is deflected to scan the area uniformly, and energy sweep ranges, often spanning 0 to 2000 eV to capture core-level and valence-band Auger transitions.^[45] Detectors employ pulse-height analysis to discriminate electron energies and reject noise, ensuring accurate intensity measurements from low-count events.^[3] Signal-to-noise ratio is improved by integrating data over multiple scans, averaging out statistical fluctuations while preserving peak shapes.^[3] Beam-induced artifacts, such as damage from electronic excitation leading to bond cleavage or desorption—particularly in organic materials—can alter surface composition during acquisition.^[46] Mitigation strategies include low-dose modes that reduce beam current, defocus the beam, or employ rastering to distribute exposure and minimize localized heating or charging effects.^[46] In modern systems, fast acquisition is enabled by parallel detection schemes, such as multi-channel analyzers that simultaneously record electrons across multiple energy channels using microchannel plates and segmented anodes, reducing acquisition times for imaging and profiling without sacrificing resolution.^[25]^[47]

Data Analysis

Qualitative Spectrum Interpretation

Qualitative interpretation of Auger electron spectra involves identifying elements and chemical states primarily through the positions and shapes of characteristic peaks, relying on established databases for reference Auger transition energies. The National Institute of Standards and Technology (NIST) provides comprehensive databases for surface analysis, including Auger electron spectroscopy (AES) peak positions derived from experimental data on pure elements and compounds.^[48] These databases facilitate element identification by matching observed kinetic energies to known Auger transitions, such as KLL, LMM, or MNN series, with typical uncertainties of 1-2 eV sufficient for unambiguous assignment in most cases.^[3] A key aspect of qualitative analysis is recognizing chemical shifts in peak positions, which arise from changes in the valence electron environment and typically range from 1 to 5 eV.^[49] These shifts reflect variations in oxidation states or bonding, enabling differentiation of chemical species without quantitative intensity measurements. For example, in titanium, the LMM Auger peak for metallic Ti occurs at approximately 387 eV kinetic energy, shifting to lower kinetic energy by about 3-5 eV in TiO₂ due to increased binding energies in the oxidized state.^[50] Such valence band influences are more pronounced in Auger transitions involving valence electrons, providing insights into local chemistry. AES spectra exhibit distinct features that aid interpretation: a sharp zero-loss (elastic) peak at the primary beam energy, a broad low-energy tail from secondary electrons (typically below 50 eV), and the Auger peaks themselves, which are narrow and well-defined for metallic samples but broader with more fine structure in insulators due to differential charging effects.^[25] Common elemental peaks include the carbon KLL transition at 272 eV and oxygen KLL at 503 eV, often used as markers for surface contamination. Peak overlaps, such as between carbon and nearby metal transitions, are resolved by acquiring spectra in derivative mode (dN/dE), which amplifies peak edges and suppresses the continuous background, enhancing resolution without additional instrumentation.^[51] In comparison to related techniques, AES kinetic energies lack the direct binding energy reference of X-ray photoelectron spectroscopy (XPS), where peaks are calibrated against the Fermi level, necessitating AES reliance on transition-specific databases for absolute identification.^[52] Unlike electron energy loss spectroscopy (EELS), which probes bulk properties in transmission mode, AES is inherently surface-specific, with information limited to the top 2-5 nm due to inelastic mean free paths.^[25]

Quantitative Analysis Methods

Quantitative analysis in Auger electron spectroscopy (AES) relies on element-specific sensitivity factors S_i, which account for variations in the ionization cross-section of the core level, the inelastic mean free path (IMFP) determining the escape depth of Auger electrons, and the detector efficiency for electrons of different kinetic energies.^[53]^[54] These factors enable the conversion of measured peak intensities into atomic concentrations, with S_i typically derived from theoretical models or empirical calibration.^[55] The relative sensitivity factor (RSF) method is a widely adopted approach for multi-element quantification, where RSFs are calibrated relative to a reference element, often using pure elemental standards under similar experimental conditions.^[56] The atomic concentration C_i of element i is calculated using the formula:

C_i = \frac{I_i / S_i}{\sum (I_j / S_j)}

where I_i and I_j represent the measured peak intensities, typically taken as the peak-to-peak height in derivative mode spectra to enhance signal-to-background contrast.^[55] This normalization ensures that the sum of concentrations equals unity, assuming a homogeneous surface composition.^[56] For thin films, where substrate effects are significant, quantification uses RSF methods with corrections for overlayer attenuation or substrate contributions, based on exponential models incorporating the IMFP to account for signal damping from deeper layers.^[55] Matrix effects, such as elastic and inelastic scattering, are corrected by incorporating the IMFP, which varies with electron energy and material density, to adjust for attenuation of the Auger signal from deeper layers.^[57] The homogeneous approximation in AES is valid for the top approximately 3λ of the surface, where λ (the IMFP) is about 1 nm, yielding accuracies of 1-10 at.% for major elements in well-characterized systems.^[58] Standards-based quantification employs spectra from pure metal references to determine empirical RSFs, providing a practical baseline for unknown samples and minimizing instrumental variations.^[59] For insulators, where charging distorts spectra, phi-rho-Z corrections adapt electron-probe microanalysis principles to account for electron penetration depth (ρz) and backscattering, enabling reliable quantification when combined with low-energy flood guns.^[57] In multi-component systems with overlapping peaks, factor analysis decomposes spectra into independent chemical components by eigenvalue analysis of data matrices, resolving contributions without assuming peak shapes and improving accuracy for complex alloys since the 2010s.^[60]^[61]

Applications

Surface Composition and Chemistry

Auger electron spectroscopy (AES) is a non-destructive technique primarily used for analyzing the elemental composition of surfaces and near-surface regions, probing depths of approximately 5-10 nm. It detects elements from lithium (Z=3) to uranium (Z=92), excluding hydrogen and helium, with typical detection limits around 0.1 atomic percent, enabling sub-monolayer sensitivity for most species.^[62]^[63] This surface specificity arises from the inelastic mean free path of Auger electrons, making AES ideal for studying the topmost atomic layers without significant substrate interference.^[3] In corrosion studies, AES quantifies oxide thicknesses on metals, such as passivation layers on stainless steel, revealing elemental distributions that indicate degradation mechanisms. For catalysis, it characterizes surface adsorbates on catalyst particles, identifying active sites and promoters to optimize reaction pathways. In semiconductors, AES detects interface segregation, such as dopant accumulation at boundaries, which affects device performance.^[64]^[65]^[62] Chemical speciation in AES relies on Auger peak shifts due to changes in the local electronic environment; for instance, oxidized states exhibit lower kinetic energies compared to metallic forms, as seen in the Fe LMM transition where Fe³⁺ peaks shift by several eV relative to Fe⁰. This enables differentiation of metallic versus oxidized chromium or aluminum in alloys. On polymer surfaces, AES identifies functional groups through such shifts, though charging effects often require conductive coatings for accurate analysis.^[66]^[67]^[68] AES has been widely applied in failure analysis for microelectronics since the 1980s, identifying contaminants like sub-micrometer particles or ionic residues on integrated circuits that cause device failures. It integrates effectively with X-ray photoelectron spectroscopy (XPS) to provide complementary valence band information, enhancing chemical state resolution beyond AES alone. Environmental AES variants enable in-situ studies of surfaces under gas exposure, such as oxide formation during pulsed laser deposition in reactive atmospheres.^[69]^[70]^[71] A representative case study involves the oxidation of Ni-Cr alloys, where AES reveals chromium enrichment at the surface during exposure to oxygen at 500°C, with peak intensities indicating selective Cr oxidation to Cr₂O₃ while Ni remains largely metallic.^[72]^[73]

Depth Profiling and Imaging

Depth profiling in Auger electron spectroscopy (AES) enables the analysis of elemental composition as a function of depth by combining ion beam sputtering with sequential AES measurements. Typically, argon ions at energies of 0.5–5 keV are used for sputtering, removing material layer by layer while AES characterizes the exposed surface after each cycle.^[74]^[75] This technique achieves a depth resolution of approximately 2–5 nm per decade of signal intensity change under optimized conditions, allowing detection of compositional variations over depths up to several hundred nanometers.^[76] Sputter rates are generally on the order of 0.1–1 nm/s, depending on ion energy, incidence angle, and material properties, enabling practical profiling of thin films within reasonable acquisition times.^[77] Interface analysis via AES depth profiling is particularly valuable for detecting abrupt compositional changes in thin films and multilayers, with precision down to the monolayer (ML) level for delta layers. For example, in semiconductor heterostructures like GaAs/AlAs, transitions can be resolved with sub-nanometer accuracy, revealing interdiffusion or segregation effects.^[78] However, artifacts such as the atomic mixing zone, typically ~2 nm thick, arise from ion bombardment displacing atoms across interfaces, broadening apparent transitions.^[76]^[79] Additional challenges include preferential sputtering and interface roughening, which can be mitigated by low-energy ions (<1 keV) or sample rotation during etching. Data from these profiles are commonly presented as concentration-versus-depth plots, where elemental intensities are normalized and converted to depth scales using calibrated sputter rates, providing quantitative insights into layer thicknesses and compositions.^[80] For lateral distribution analysis, scanning Auger microscopy (SAM), a variant of AES, raster-scans a focused electron beam across the surface to generate elemental maps with resolutions of 10–100 nm, limited primarily by the beam diameter.^[78] This allows visualization of inhomogeneities, such as defect sites or segregation, through two-dimensional intensity maps of specific Auger peaks; line profiles along scan paths further quantify variations, e.g., in nanowires or heterostructures.^[78] Applications include characterizing multilayer coatings for adhesion and diffusion barriers, where AES reveals interlayer mixing in systems like Ti/NiV/Ag or TiAlN/ZrN.^[81]^[82] In welds, such as laser-welded Al alloys, SAM identifies porosity mechanisms and oxide inclusions at interfaces.^[83] For nanoparticles, AES provides surface chemistry details, e.g., oxide layers on Si or silica particles, aiding in stability and reactivity assessments.^[84]^[85] Recent advances since 2020 include focused ion beam (FIB) hybrids for 3D tomography, enabling volumetric reconstruction by serial sectioning in nanostructures like lithium battery electrodes or multilayers.^[86]^[87] These techniques extend beyond 2D imaging, offering ~10 nm lateral and ~2 nm depth resolutions for complex, non-planar features.^[78]

Limitations and Advances

Sensitivity and Resolution Constraints

The sensitivity of Auger electron spectroscopy (AES) is typically on the order of 0.1–1 atomic percent, corresponding to detection limits of approximately 10^{11}–10^{12} atoms/cm² for most elements in the periodic table from lithium to uranium. However, the technique exhibits poor sensitivity for hydrogen and helium, as these elements lack suitable inner-shell electrons for Auger transitions, while lithium's low-energy Auger peak results in low yield and high background noise. Sensitivity is also matrix-dependent, primarily due to variations in the inelastic mean free path (IMFP) of Auger electrons, which ranges from 0.5–3 nm depending on the material's composition and the electron kinetic energy (typically 30–3000 eV); this affects the probability of electrons escaping the surface without inelastic scattering.^[62]^[1]^[88] Spatial resolution in AES is constrained by the primary electron beam diameter, which can be focused to 5–50 nm using field emission guns, but intrinsic delocalization from elastic and inelastic scattering broadens the effective analysis area to several nanometers, with practical spatial resolutions down to about 8 nm for Auger mapping in high-resolution systems. The extreme surface specificity of AES—probing only the top 1–5 nm—makes it highly susceptible to contamination; for instance, brief exposure to laboratory air (on the order of 1 minute) can deposit approximately one monolayer of adventitious carbon (~10^{15} atoms/cm²), overwhelming signals from underlying elements. Furthermore, the electron beam (typically 1–30 keV) can cause radiation damage, particularly in beam-sensitive materials like organics, leading to bond breaking, desorption, or structural alterations during analysis.^[1]^[89]^[90] Energy resolution in AES, determined by the analyzer (e.g., hemispherical or cylindrical mirror), is typically 0.5–5 eV (about 0.1–0.5% of the kinetic energy), which often limits differentiation of closely spaced peaks for light elements, such as the overlap between carbon (KLL at ~272 eV) and nitrogen (KLL at ~379 eV). Quantitative analysis faces additional constraints, with relative sensitivity factor (RSF) uncertainties of 10–20% for minority species due to matrix effects and peak shape variations; in depth profiling via ion sputtering, preferential sputtering of lighter elements further distorts measured compositions by up to several atomic percent.^[91]^[89]

Recent Developments and Variants

Scanning Auger microscopy (SAM), a variant of AES, enables high-spatial-resolution elemental mapping by combining the scanning capabilities of a scanning electron microscope with Auger electron detection, achieving lateral resolutions down to 8 nm for analyzing complex surfaces like solder alloys and nanoparticles.^[92]^[93] Energy-filtered AES improves spectral quality by selectively detecting electrons within specific energy windows, reducing background noise from inelastic scattering and enhancing chemical contrast in secondary electron images for surface analysis.^[94]^[95] Ambient pressure AES facilitates operando studies of catalytic surfaces under realistic gas environments by operating at near-atmospheric pressures, allowing in-situ observation of reaction dynamics without ultra-high vacuum constraints.^[96] Post-2015 advancements in high-brightness field-emission electron sources have pushed AES spatial resolution below 10 nm, enabling nanoscale surface characterization of materials like battery electrodes with depths of approximately 5 nm.^[92]^[2] Emerging computational methods are being explored to enhance spectral analysis in AES and related techniques.^[97] Auger Photoelectron Coincidence Spectroscopy (APECS) enhances surface determination by combining AES with photoelectron coincidence detection for improved depth selectivity, as demonstrated in studies since 2024.^[98] Compared to X-ray photoelectron spectroscopy (XPS), AES offers faster imaging speeds due to electron beam excitation but provides less detailed chemical state information, making it complementary for high-throughput surface elemental mapping.^[99] Versus SEM-EDX, AES excels in surface-sensitive detection (top 1-10 nm) of light elements and all species except H and He, while SEM-EDX is bulk-oriented and struggles with low atomic number elements due to X-ray absorption.^[100]^[101] Synchrotron-based AES utilizes tunable X-ray excitation to enhance depth selectivity, allowing probing of specific emission depths by varying photon energy and leveraging coincidence detection for improved surface specificity since the 2010s.^[98]^[102] Future directions include efforts to integrate AES with other nanoscale techniques for correlative analysis, addressing current vacuum and resolution limitations.^[92]

References

[1]
Auger Electron Spectroscopy - SERC (Carleton)
May 10, 2021 · Auger Electron Spectroscopy (AES) is a surface-sensitive analytical method the provides compositional information in the near-surface environment of materials.
[2]
Field Emission Auger Electron Spectroscopy with Scanning ... - NREL
Jan 6, 2025 · NREL uses Auger electron spectroscopy (AES) for elemental surface analysis, depth profiling, small feature analysis, and imaging.
[3]
[PDF] CHAPTER 10 AUGER ELECTRON SPECTROSCOPY
Auger electron spectroscopy (AES) is a nondestructive core-level electron spectroscopy for semi-quantitative determination of the elemental.
[4]
Scientific Principle of Auger Electron Spectroscopy
Auger Electron Spectroscopy (AES) is a surface-sensitive spectroscopic technique used for elemental analysis of surfaces.
[5]
[PDF] Ab initio calculations of Auger electron kinetic energies
Aug 13, 2022 · Three electrons are involved in the Auger process and the three shells involved are used to designate the specific Auger electron. The ...
[6]
Auger Effect - HyperPhysics
The Auger effect is a process by which electrons with characteristic energies are ejected from atoms in response to a downward transition by another electron ...Missing: balance | Show results with:balance
[7]
[PDF] Bambynek et al: X-ray fluorescence yields, Auger, and Coster ...
An Auger event resulting from an inner-shell vacancy produces a doubly ionized atom; successive radiationless transitions can lead to highly ionized atomic ...
[8]
[PDF] feasibility study of auger and photoelectron spectroscopy as an ...
The formula above shows that as Z decreases the fluorescence yield decreases sharply, with a corresponding relative increase in the Auger yield.<|separator|>
[9]
Auger processes in the 21st century - PMC - PubMed Central
This phenomenon was first observed by Pierre Auger when he exposed a ... Auger effect than the thymine base. Photon activation therapy has been under ...
[10]
https://www.nist.gov/publications/information-depth-and-mean-escape-depth-auger-electron-spectroscopy-and-x-ray
[11]
The Information Depth and the Mean Escape Depth in Auger ...
Jan 1, 2003 · The information depth (ID) is a measure of the sampling depth for the detected signal in Auger-electron spectroscopy (AES) and x-ray photoelectron spectroscopy ...
[12]
[PDF] An Introduction to Surface Analysis by XPS and AES
and AES - the cylindrical mirror analyser (CMA) and the hemispherical sector analyser (HSA). The CMA is used when it is not important that the highest ...
[13]
https://physicstoday.scitation.org/doi/10.1063/PT.3.4216
[14]
[PDF] SUMMARY The secondary electron emission characteristics for a ...
To overcome severe charging effects experienced with a thick insulating coating such as anodized samples we have developed a pulsed beam technique using ...
[15]
ESCApe Software | Kratos Analytical
ESCApe software provides a comprehensive toolkit for data processing. We've automated peak-ID and survey spectrum quantification. Powerful data reduction ...
[16]
[PDF] The Surface Analysis Toolbox: - Thermo Fisher Scientific
The multi-technique possibilities offered by Thermo Scientific systems opens the way for a more complete analysis of your samples. XPS. REELS. Raman. ISS. UPS.
[17]
Angle-Resolved Auger Spectroscopy as a Sensitive Access to ...
In this Letter, we utilize this advantage of the angle-resolved Auger electron spectroscopy [27] to study vibronic coupling effects in core-to-Rydberg excited ...
[18]
Auger Electron Spectroscopy (AES) Tutorial | EAG Laboratories
The photoelectron energies follow the Einstein photoelectric law (kinetic energy = photon energy – binding energy). The Auger process also contributes peaks to ...
[19]
Comparison of electron sources for high‐resolution Auger ...
Dec 1, 1976 · A LaB6 source is clearly superior to FE sources at primary beam currents of greater than 1×10−8 A. Topics. Thermionic emission, Electronic noise ...
[20]
JAMP-9510F Field Emission Auger Microprobe - Jeol USA
The JAMP-9510F Field Emission Auger Microprobe offers the highest spatial resolution available in an Auger microprobe: (min. probe diameter of 3nm SEI; 8nm for ...
[21]
Auger Electron Spectroscopy (AES) | Kratos Analytical
As outlined above, the technique involves the irradiation of the sample with a high energy (3 – 10 keV) focused electron beam. Described in simple terms, the ...
[22]
PHI 710 AES Instrument for Surface Analysis - Physical Electronics
Coaxial electron gun and analyzer geometry provides the sensitivity and unobstructed vision needed to fully characterize the microstructures that exist on most ...
[23]
PHI 710 | AES | Surface Analysis | Product
Instruments with non-coaxial geometry suffer from geometric effects that dramatically reduce instrumental sensitivity and even create shadows that prevent any ...
[24]
[PDF] Auger Electron Spectroscopy(AES)
Modern instruments nearly always incorporate cylindrical mirror analyzers because their high transmission efficiency leads to better signal-to-noise ratios.
[25]
https://www.eag.com/app-note/auger-tutorial/
[26]
Auger Spectroscopy | RBD Instruments
Now known as the Auger Effect, this phenomenon was first developed into commercial Auger spectrometers in the 1960s and evolved from simple TFA (thin film ...
[27]
Auger electron spectroscopy - AIP Publishing
Auger electron spectroscopy (AES) is a well-established technique for ... tem dead times, and then the channel electron multiplier must be used in the ...
[28]
Angular‐resolved Auger emission spectra from a clean Cu(100 ...
Jan 1, 1976 · Previous measurements of the angular emission of Auger electrons from a clean Cu(110) surface, using a Faraday cup retarding‐field analyzer,
[29]
Advancements in the use of Auger electrons in science and ...
Advancements include understanding Auger processes, new emitters in therapy, and localized radiation for precision in science and medicine.
[30]
[PDF] CodI=- 77 \(\a"- - OSTI
A vacuum transfer system has been developed that allows samples to be inserted from air into an Auger analyzer. Following an initial analysis they may.
[31]
In situ tensile fracture device for Auger electron spectroscopy
The fracture surfaces were in situ analyzed by AES immediately after the specimen was cooled to room temperature. Natural cooling rate of a specimen is 15 ...
[32]
[PDF] X-ray Photoelectron Spectroscopy (XPS) Auger Electron ...
XPS, a much more surface sensitive technique, was used. Inside the crater ... • AES analysis conducted to investigate corrosion at the grain boundaries.
[33]
[PDF] Enhanced contamination of Si(001) when analyzed by AES with ...
May 31, 2011 · Clean Si(001) single crystal surfaces are obtained by cycles of long (30 mins.) annealings in ultrahigh vacuum (fairly below.
[34]
Approaches to analyzing insulators with Auger electron spectroscopy
This paper provides an updated overview, intended to be of practical value to analysts, of methods that can be applied to minimize or control the build-up ...
[35]
Ultrahigh vacuum three-axis cryogenic sample manipulator for angle ...
Jun 1, 2003 · The sample manipulator is constructed by combining three modules with translation, polar rotation, and azimuthal-tilt rotation capabilities.
[36]
Auger Electron Spectroscopy (AES) Analysis Laboratory
The sampling depth is 15-30 monolayers (50-100Å) and it can distinguish features as small as 0.1 µm, AES dos elemental analysis of unknown conductive materials ...
[37]
Auger electron spectroscopy and microscopy with probe-size limited ...
A 10 ms per pixel dwell time and 0.3 nA probe current resulted in a 10 min acquisition time for each 256 pixel by 240 line energy- filtered SE image. Externally ...
[38]
Auger electron spectroscopy
In this way the CMA selects the electrons according to their energy by sweeping through energies from 10–2000 eV, however, partial sweeps can also be used ...Missing: ranges valence<|separator|>
[39]
Electron beam damage in Auger electron spectroscopy - Penn State
The damaging effects of electronic excitation, charging and beam heating during Auger electron spectroscopy (AES) are treated. The origin, manifestation and ...<|separator|>
[40]
Parallel acquisition electrostatic electron energy analyzers for high ...
This analyzer has been first applied in the field of Auger electron spectroscopy, where we demonstrate the capability of fast data acquisition at high vacuum, ...
[41]
Surface Data | NIST - National Institute of Standards and Technology
Aug 30, 2010 · The surface databases provide data for surface analysis by Auger-electron spectroscopy (AES) and X-ray photoelectron spectroscopy (XPS).
[42]
Chemical Shifts in the Auger Spectrum of Yttrium on Oxygen ...
Auger electron spectroscopy (AES) has proven to be an invaluable tool for ... ESCA studies have revealed 1-5 eV shifts in the K and L levels of oxides ...
[43]
[PDF] Real-time monitoring of oxidation on the Ti(0001) surface by ...
Feb 19, 2003 · The chemical shift of Ti 2p3/2 for TiO, Ti2O3 and Ti3O5 was reported to be 1.2 eV, 2.8 eV and 3.9 eV, respectively. [11]. Their peak positions ...
[44]
Method for correcting peak overlaps in quantitative Auger electron ...
Dec 17, 2019 · This paper provides a new method for improving the quantitative accuracy of Auger electron spectroscopy (AES) when measuring the surface ...
[45]
What are differences between X-ray Photoelectron Spectroscopy ...
Apr 4, 2016 · The fundamental principles of the two techniques are the same. One is a single photo-emission step (XPS), the other is a two-step emission process (AES).
[46]
Quantitative Auger electron spectroscopy using elemental sensitivity ...
Jan 1, 1976 · Elemental sensitivity factors are derived in terms of the core‐level ionization cross sections ... escape depth, and the backscattering factor.
[47]
ionization cross-section and electron mean free path - ScienceDirect
On the semi-empirical elemental sensitivity factors for AES: ionization cross-section and electron mean free path ... escape depth, and the escape ...
[48]
The Physica B&Cl Basis for Quantitative Surface Analysis by Auger ...
Jan 1, 1978 · A review is given of the physical basis for quantitative surface analysis by Auger electron spectroscopy (AES) and by X-ray photoelectron ...
[49]
Consistent, combined quantitative Auger electron spectroscopy and ...
The formalism for quantitative analysis in AES and XPS, using relative sensitivity factors, has been revised to develop an accurate matrix-less formalism that ...
[50]
New approach in Auger elemental relative sensitive factor ...
Auger Electron Spectroscopy (AES) has been proved to be a suitable microanalytical tool to check for possible migration of Ni on the silver surface because of ...
[51]
Standard Approaches to XPS and AES Quantification—A Summary ...
Nov 18, 2024 · This article provides a summary of the new, updated standard and the methods described therein, noting in particular the revisions made since ...
[52]
Quantitative surface analysis by Auger and x-ray photoelectron ...
Recent developments in quantitative surface analysis by Auger (AES) and x-ray photoelectron (XPS) spectroscopies are reviewed and problems relating to a ...
[53]
Methods for quantitative analysis in XPS and AES - Grant - 1989
The approach taken for quantitative analysis often depends on the data acquisition method, although there are several subsequent data processing methods that ...
[54]
Application of factor analysis in electron spectrometry (AES, XPS) for ...
Aug 7, 2025 · We demonstrate for AES and XPS measurements, how factor analysis (FA) can help to derive chemical information at Ti-based material developed for ...
[55]
Multicomponent quantitative analysis by Auger electron spectroscopy
stances include overlapping peaks from different elements or different chemical species of the same element in the system under study. The addition of ...
[56]
Auger Electron Spectroscopy (AES) - EAG Laboratories
Auger Electron Spectroscopy is a surface-sensitive analytical technique, useful for elemental analysis of small surface features.
[57]
14.4.2: Auger Electron Spectroscopy - Chemistry LibreTexts
Jul 24, 2025 · Two common detectors are the cylindrical mirror analyzer and the concentric hemispherical analyzer discussed below. Notably, concentric ...
[58]
Auger electron spectroscopy and its use for the characterization of ...
This review paper provides the basic background and underlying theory behind Auger electron spectroscopy (AES). Among the many surface analytical tools, AES ...
[59]
AES Analysis for Catalyst Surface Analysis - Rocky Mountain Labs
Feb 12, 2024 · Auger Electron Spectroscopy (AES) has emerged as a powerful analytical technique for studying catalyst surfaces, offering unparalleled insights ...
[60]
1.14: Auger Electron Spectroscopy - Chemistry LibreTexts
Aug 28, 2022 · An Auger electron comes from a cascade of events. First, an electron beam comes in with sufficient energy to eject a core electron creating a ...Missing: mechanism | Show results with:mechanism
[61]
Oxide-state evaluation of the zinc and aluminium in metallic thin ...
Large, oxidation-state-dependent, kinetic-energy shifts of the Al KLL and Zn LMM peaks were used to evaluate the oxide state of the elements inside the layers.
[62]
Polymer analysis by Auger electron spectroscopy using sectioning ...
Efficient polymer analyses have been performed by Auger electron spectroscopy in combination with sectioning and cryogenic cooling, to prevent surface ...
[63]
Applications of Auger Electron Spectroscopy in Microelectronics
Jan 28, 1986 · Auger electron spectroscopy (AES) has a broad range of applications in the microelectronics ... failure analysis and process development. The ...
[64]
X-Ray Photoelectron Spectroscopy Surface Analysis Techniques
While Auger features can be observed in XPS spectra, AES provides elemental and some chemical state information, serving as a valuable complement to XPS ...
[65]
In situ Auger electron spectroscopy of complex oxide surfaces grown ...
Oct 1, 2019 · The authors address some of the challenges in achieving in situ and real-time AES studies on complex oxide thin films grown by PLD.
[66]
Oxidation Study of a Polycrystalline Ni/Cr Alloy II
### Summary of AES Study on Ni/Cr Alloy Oxidation
[67]
Early stage oxidation of Ni–Cr binary alloy (1 1 ... - ScienceDirect.com
The oxygen atoms adsorbed on the alloy surface will influence the surface segregation of the alloy elements and promote the selective oxidation of the alloy ...
[68]
Preferential sputtering of InP: an AES investigation - ScienceDirect
AES was used to determine the surface composition of InP bombarded with 0.5 to 5 keV Ar+ ions. The (100), (110) and some vicinal planes were sputtered.Missing: typical | Show results with:typical
[69]
Evaluation of AES depth profiles with serious artefacts in C/W ...
Apr 30, 2022 · In this paper we will report on the application of this method for the depth profiling of layer systems containing carbon and tungsten layers.Missing: zone | Show results with:zone
[70]
[PDF] 1 Ultimate Depth Resolution and Profile Reconstruction in Sputter ...
Depth resolution is the broadening of a measured profile. The ultimate depth resolution is predicted to be about 0.7-1.0 nm, with current values of 1.4-1.6 nm.
[71]
[PDF] A quantitative evaluation of the depth resolution of AES depth ...
The time scale was converted into the depth scale using the average sputtering rate of 0.05nm/s determined by depth profiling data with the known thicknesses of ...
[72]
Scanning Auger microscopy for high lateral and depth elemental ...
New generation Auger nanoprobes combine high lateral (∼10 nm), energy (0.1%) and depth (∼2 nm) resolutions thus offering the possibility to analyze the ...
[73]
Original and sputtering induced interface roughness in AES sputter ...
Today, the accuracy of quantification of sputter depth profiles of layered nanostructures is typically about 20% of a monolayer, or 0.06 nm on the elemental ...
[74]
Sputter depth profiling: past, present, and future - Hofmann
Apr 24, 2014 · Sputter depth profiling is a direct method to obtain the in-depth distribution of composition in thin films, at surfaces and at interfaces.
[75]
Auger electron spectroscopy characterization of Ti/NiV/Ag multilayer ...
In this work we have investigated a suitable way to monitor Ni migration on Ti/NiV/Ag back metallization layer, using the Auger electron spectroscopy (AES) ...Missing: nanoparticles | Show results with:nanoparticles
[76]
Multilayered coatings with alternate ZrN and TiAlN superlattices
Dec 19, 2007 · In this work, we used the surface sensitive technique of Auger electron spectroscopy (AES) with a PHI model P660 SAM system to measure elemental ...
[77]
Auger electron spectroscopy on a laser-welded 6061 Al alloy
Auger spectroscopy has been utilized to investigate the mechanisms of formation of porosity in a laser-welded 6061 Al alloy. The analyses carried out on the ...
[78]
Investigation of silica nanoparticles by Auger electron spectroscopy ...
Jan 16, 2014 · Analyzing dielectric materials like Silica charging effects can appear that influences Auger electrons and consequently Auger spectra ( ...
[79]
Silicon nanoparticles characterization by Auger electron spectroscopy
In this work, the model that takes into account the influence of an adsorbed layer on the Rsi l value is proposed and applied for the silicon nanoparticle ...
[80]
Advances in Focused Ion Beam Tomography for Three-Dimensional ...
This paper describes in detail the steps required to perform this analysis, from the experimental setup to the data analysis and final reconstruction.Missing: AES | Show results with:AES
[81]
Roadmap for focused ion beam technologies - AIP Publishing
Dec 26, 2023 · The focused ion beam (FIB) is a powerful tool for fabrication, modification, and characterization of materials down to the nanoscale.
[82]
Surface Sensitivity of Auger-Electron Spectroscopy and X-Ray ...
Feb 1, 1998 · A convenient measure of surface sensitivity in Auger-electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) is the mean escape ...
[83]
Critical Review Precision, accuracy, and uncertainty in quantitative ...
We identify in this article the major steps in typical surface analyses by Auger-electron spectroscopy (AES) and x-ray photoelectron spectroscopy (XPS) and ...
[84]
[PDF] Interfacial Stability of Thin Film Hydrogen Sensors
Feb 13, 2000 · ... 1 second or less), so that ... Air exposure of the clean Pd surface results in the buildup of a monolayer of carbon bearing compounds.
[85]
(PDF) Auger Electron Spectroscopy-A Review - ResearchGate
Aug 6, 2025 · Auger electron spectroscopy (AES) is surface sensitive analytical technique mainly, it provides quantitative elemental and chemical state information from ...
[86]
State-of-the-Art Applications of Auger Electron Spectroscopy
Jun 18, 2025 · These applications include nanomaterials, photovoltaics, catalysis, corrosion, adhesion, semiconductor devices and packaging, magnetic media, ...Missing: welds | Show results with:welds
[87]
Scanning augerelectron microscopy - Uni-DUE
Jun 30, 2022 · A scanning auger microscope (SAM) combines the scanning power and spatial resolution of a scanning electron microscope (SEM) with the element specific analysis ...Missing: AEI | Show results with:AEI
[88]
Next generation secondary electron detector with energy analysis ...
... energy filtered images, scanning electron microscope. Introduction. Auger electron spectroscopy (AES) is a widely established technique for elemental ...
[89]
Secondary electron-, Auger electron- and reflected electron ...
The CMA has a coaxial electron gun and the polar acceptance angle of the CMA is 42.3 ± 6°. All electron signals are measured by electrometers (Keithley ...
[90]
NAP-Auger Electron Spectroscopy (AES) & EELS
Oct 6, 2020 · Auger Electron Spectroscopy (AES) at Near Ambient Pressure. A new energy spectrometer was developed to perform in-situ and experimendo ...
[91]
https://www.researchgate.net/publication/336425680_Auger_Electron_Spectroscopy-A_Review
[92]
Auger electrons for cancer therapy – a review
Oct 11, 2019 · The Auger effect describes the process in which a vacancy in an inner electron orbital (i.e. K-shell) is filled by the decay of an electron ...
[93]
The Difference Between ESCA/XPS Analysis And AES?
Jun 30, 2016 · AES can be performed on conductive and semi-conductive materials, ESCA can be performed on these types of materials in addition to polymers, ...
[94]
Auger Electron Spectroscopy - an overview | ScienceDirect Topics
AES instrumentation typically includes an electron gun for primary electron excitation of the sample, an electron spectrometer for energy analysis of secondary ...
[95]
[PDF] Auger Electron Spectroscopy (AES)
The Auger process competes with x-ray fluorescence in an excited ion. Auger electron emission is the more probable decay mechanism for low energy transitions, ...
[96]
Enhanced Surface Determination beyond Photoemission via Auger ...
Aug 2, 2024 · This paper demonstrates the capabilities of Auger PhotoElectron Coincidence Spectroscopy (APECS) to obtain data with varying surface sensitivities from a ...
[97]
Depth-selective X-ray absorption spectroscopy by detection of ...
Yasuji Kimoto. In Auger electron spectroscopy (AES), the spectral background is mainly due to inelastic scattering of Auger electrons that lose their kinetic ...
[98]
AFM and LEED of Hybrid Si-based Graphene Interface ...
The observation of various surface phase formations, their transitions, and their dependence on deposition parameters are probed by Auger electron spectroscopy ...